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上海微系统与信息技... [17]
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期刊论文 [17]
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2012 [1]
2011 [2]
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专题:上海微系统与信息技术研究所
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Chemical mechanical polishing of stainless steel foil as flexible substrate
期刊论文
APPLIED SURFACE SCIENCE, 2012, 卷号: 258, 期号: 15, 页码: 5798-5802
Hu, XK
;
Song, ZT
;
Liu, WL
;
Qin, F
;
Zhang, ZF
;
Wang, HB
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2013/04/17
Chemical mechanical polish
Stainless steel
Flexible substrate
Colloidal silica
Electrochemical corrosion
Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
期刊论文
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 卷号: 14, 期号: 3, 页码: H128-H131
Wang,LY
;
Liu,B
;
Song,ZT
;
Liu,WL
;
Feng,SL
;
Huang,D
;
Babu,SV
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2012/04/10
ELECTROCHEMICAL SOC INC
Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
期刊论文
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 卷号: 14, 期号: 3, 页码: H128-H131
Wang, LY
;
Liu, B(重点实验室)
;
(重点实验室)
;
song, zt(重点实验室)
;
Liu, WL
;
Feng, SL(重点实验室)
;
Huang, D
;
Babu, SV
收藏
  |  
浏览/下载:12/0
  |  
提交时间:2013/05/10
Electrochemistry
Materials Science
Multidisciplinary
Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application
期刊论文
MICROELECTRONIC ENGINEERING, 2010, 卷号: 87, 期号: 9, 页码: 1751-1755
Hu, XK
;
Song, ZT
;
Wang, HB
;
Liu, WL
;
Zhang, ZF
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2012/03/24
MATERIAL REMOVAL RATE
SOL-GEL METHOD
SODIUM-SILICATE
SLURRY
PLANARIZATION
FABRICATION
PARTICLES
CRYSTALS
WAFERS
Preparation of Silica Abrasives from Water Glass and Application in Silicon Wafer Polishing
期刊论文
POWDER TECHNOLOGY AND APPLICATION II, 2010, 卷号: 92, 页码: 183-187
Hu,XK
;
Song,ZT
;
Wang,HB
;
Liu,WL
;
Qin,F
;
Zhang,ZF
收藏
  |  
浏览/下载:113/0
  |  
提交时间:2012/03/24
CHEMICAL-MECHANICAL PLANARIZATION
SOL-GEL METHOD
COLLOIDAL SILICA
PARTICLES
SLURRY
High Purity Nano Abrasives for Chemical Mechanical Planarization Application
期刊论文
INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2, 2010, 页码: 996-996
Liu, WL
;
Song, ZT
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2012/03/24
Synthesis, characterization of ceria-coated silica particles and their chemical mechanical polishing performance on glass substrate
期刊论文
APPLIED SURFACE SCIENCE, 2010, 卷号: 257, 期号: 5, 页码: 1750-1755
Zhang, ZF
;
Liu, WL
;
Zhu, JK
;
Song, ZT
收藏
  |  
浏览/下载:10/0
  |  
提交时间:2012/03/24
CMP BEHAVIOR
SURFACE MODIFICATION
NANO-ABRASIVES
GENERAL-METHOD
NANOPARTICLES
OXIDE
STABILITY
Two-Step Chemical Mechanical Polishing of Sapphire Substrate
期刊论文
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2010, 卷号: 157, 期号: 6, 页码: H688-H691
Zhang, ZF
;
Liu, WL
;
Song, ZT
;
Hu, XK
收藏
  |  
浏览/下载:19/0
  |  
提交时间:2012/03/24
PROCESS PARAMETERS
COLLOIDAL SILICA
CMP
PLANARIZATION
ABRASIVES
Preparation of Silica Abrasives from Water Glass and Application in Silicon Wafer Polishing
期刊论文
POWDER TECHNOLOGY AND APPLICATION II, 2010, 卷号: 92, 页码: 183-187
Hu, XK
;
song, zt(重点实验室)
;
Wang, HB
;
Liu, WL
;
Qin, F
;
Zhang, ZF
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2013/05/10
Materials Science
Materials Science
Multidisciplinary
Coatings & Films
Investigation on the controllable growth of monodisperse silica colloid abrasives for the chemical mechanical polishing application
期刊论文
MICROELECTRONIC ENGINEERING, 2010, 卷号: 87, 期号: 9, 页码: 1751-1755
Hu, XK
;
song, zt(重点实验室)
;
Wang, HB
;
Liu, WL
;
Zhang, ZF
收藏
  |  
浏览/下载:13/0
  |  
提交时间:2013/05/10
Engineering
Physics
Electrical & Electronic
Nanoscience & Nanotechnology
Applied
Optics
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