Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films

	Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
	Wang,LY ; Liu,B ; Song,ZT ; Liu,WL ; Feng,SL ; Huang,D ; Babu,SV
刊名	ELECTROCHEMICAL AND SOLID STATE LETTERS
	2011
卷号	14 期号:3 页码:H128-H131
关键词	ELECTROCHEMICAL SOC INC
ISSN号	1099-0062
学科主题	Electrochemistry; Materials Science ; Multidisciplinary
公开日期	2012-04-10
内容类型	期刊论文
源URL	[http://ir.sim.ac.cn/handle/331004/106775]
专题	上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式 GB/T 7714	Wang,LY,Liu,B,Song,ZT,et al. Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS,2011,14(3):H128-H131.
APA	Wang,LY.,Liu,B.,Song,ZT.,Liu,WL.,Feng,SL.,...&Babu,SV.(2011).Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films.ELECTROCHEMICAL AND SOLID STATE LETTERS,14(3),H128-H131.
MLA	Wang,LY,et al."Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films".ELECTROCHEMICAL AND SOLID STATE LETTERS 14.3(2011):H128-H131.