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Impact of Ge Preamorphization Implantation on Both the Formation of Ultrathin TiSix and the Specific Contact Resistivity in TiSix/n-Si Contacts 期刊论文
IEEE Transactions on Electron Devices, 2018
作者:  Ye TC(叶甜春);  Mao SJ(毛淑娟);  Wang GL(王桂磊);  Xu J(许静);  Luo X(罗雪)
收藏  |  浏览/下载：36/0  |  提交时间：2019/05/05
Study of Hetero-Tunneling gFET with an Ultra-shallow Pocket Junction 会议论文
作者:  Wang DH(王大海);  Xu GB(许高博);  Xu QX(徐秋霞);  Yin HX(殷华湘);  Zhao C(赵超)
收藏  |  浏览/下载：15/0  |  提交时间：2015/05/07
Study of Si Green Transistor with an Ultra-shallow Pocket Junction 会议论文
作者:  Li CL(李春龙);  Li JJ(李俊杰);  Xu GB(许高博);  Xu QX(徐秋霞);  Yin HX(殷华湘)
收藏  |  浏览/下载：13/0  |  提交时间：2015/05/07
Low-cost and highly manufacturable strained-Si channel technique for strong hole mobility enhancement on 35-nm gate length pMOSFETs 期刊论文
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2007, 卷号: 54, 期号: 6, 页码: 1394
Xu, QX; Duan, XF; Liu, HH; Han, ZS; Ye, TC
收藏  |  浏览/下载：15/0  |  提交时间：2013/09/18
Low-cost and highly manufacturable strained-Si channel technique for strong hole mobility enhancement on 35-nm gate length pMOSFETs 外文期刊
2007
作者:  Xu, QX;  Duan, XF;  Liu, HH;  Han, ZS;  Ye, TC
收藏  |  浏览/下载：7/0  |  提交时间：2010/11/26
Nanoscale strain analysis of strained-Si metal-oxide-semiconductor field effect transistors by large angle convergent-beam electron diffraction 期刊论文
APPLIED PHYSICS LETTERS, 2006, 卷号: 88, 期号: 26
Liu, HH; Duan, XF; Qi, XY; Xu, QX; Li, HO; Qian, H
收藏  |  浏览/下载：9/0  |  提交时间：2013/09/24
锗预非晶化注入对镍硅(NiSi)金属栅功函数的影响研究 期刊论文
电子学报, 2006
蔡一茂; 黄如; 单晓楠; 周发龙; 王阳元
收藏  |  浏览/下载：5/0  |  提交时间：2015/11/12
Study on the impact of germanium preamorphization on the work function of fully silicided NiSi gate 期刊论文
tien tzu hsueh paoacta electronica sinica, 2006
Cai, Yi-Mao; Huang, Ru; Shan, Xiao-Nan; Zhou, Fa-Long; Wang, Yang-Yuan
收藏  |  浏览/下载：4/0  |  提交时间：2015/11/13
Study on the impact of Ge-implantation on the work function of fully silicided NiSi gate as ultra-shallow junction formed by using germanium preamorphization 其他
2005-01-01
Cai, YM; Xu, C; Shan, XN; Huang, R; Wang, YY
收藏  |  浏览/下载：3/0  |  提交时间：2015/11/13
Study on the impact of Ge-implantation on the work function of fully silicided NiSi gate as ultra-shallow junction formed by using germanium preamorphization 其他
2005-01-01
Cai, Yimao; Xu, Chuan; Shan, Xiaonan; Huang, Ru; Wang, Yangyuan
收藏  |  浏览/下载：4/0  |  提交时间：2015/11/13

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