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Atomic-layer-deposited AlO passivation dependent interface chemistry, band alignment and electrical properties of HfYO/Si gate stacks 期刊论文
Journal of Materials Science & Technology, 2019, 卷号: Vol.35 No.5, 页码: 769-776
作者:  Die Wang;  Shuang Liang;  Fen Qiao;  Gang He
收藏  |  浏览/下载:9/0  |  提交时间:2019/04/24
Phosphate coatings evolution study and effects of ultrasonic on soft magnetic properties of FeSiAl by aqueous phosphoric acid solution passivation 期刊论文
Journal of Alloys and Compounds, 2019, 卷号: Vol.783, 页码: 434-440
作者:  Ruiwei Zhu;  Zhen Wang;  Mudssir Shezad;  Xucai Kan;  Wei Yang
收藏  |  浏览/下载:2/0  |  提交时间:2019/04/24
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD‐Derived Al2O3 Passivation Layer and Forming Gas Annealing 期刊论文
Advanced Electronic Materials, 2018, 卷号: Vol.4 No.4
作者:  Wendong Li;  Shuang Liang;  Li Zhu;  Mao Liu;  Mingliang Tian
收藏  |  浏览/下载:44/0  |  提交时间:2019/04/22
Atomic-layer-deposited AlO passivation dependent interface chemistry, band alignment and electrical properties of HfYO/Si gate stacks 期刊论文
Journal of Materials Science & Technology, 2018
作者:  Die Wang;  Shuang Liang;  Fen Qiao;  Gang He
收藏  |  浏览/下载:3/0  |  提交时间:2019/04/24
Synthesis and Characterization of Bi2S3 Quantum Dot–Sensitized TiO2 Nanorod Arrays coated with ZnSe Passivation Layers 期刊论文
Applied Surface Science, 2018
作者:  Jianguo Lv;  Xishun Jiang;  Lulu Fang;  Liping Jin;  Yanfen Wang
收藏  |  浏览/下载:6/0  |  提交时间:2019/04/24
Modulation of electrical properties and current conduction mechanism of HfAlO/Ge gate stack by ALD-derived Al2O3 passivation layer 期刊论文
Journal of Alloys and Compounds, 2017, 卷号: Vol.695, 页码: 1591-1599
作者:  Li,W. D.;  Jin,P.;  Wei,H. H.;  Xiao,X. D.;  Gao,J.
收藏  |  浏览/下载:4/0  |  提交时间:2019/04/22
Modulation of interfacial and electrical properties of HfGdO/GaAs gate stacks by ammonium sulfide passivation and rapid thermal annealing 期刊论文
Journal of Alloys and Compounds, 2017, 卷号: Vol.704, 页码: 322-328
作者:  Lv,J. G.;  Li,W. D.;  Zheng,C. Y.;  Zhu,L.;  Liang,S.
收藏  |  浏览/下载:5/0  |  提交时间:2019/04/22
Passivation of Ge surface treated with trimethylaluminum and investigation of electrical properties of HfTiO/Ge gate stacks 期刊论文
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 2017, 卷号: Vol.33 No.8, 页码: 901-906
作者:  Jiang,Shanshan;  Zhu,Li;  Gao,Juan;  Xiao,Dongqi;  Liang,Shuang
收藏  |  浏览/下载:8/0  |  提交时间:2019/04/24
Corrosion resistance of Ni/Cu/Ni–P triple-layered coating on Mg–Li alloy 期刊论文
Surface and Coatings Technology, 2014, 卷号: Vol.254, 页码: 440-446
作者:  Jin,Nan;  Wang,Lu;  Chen,Weiwei;  Luo,Dawei;  Chen,Dehua
收藏  |  浏览/下载:3/0  |  提交时间:2019/04/22
Modulating the Interface Quality and Electrical Properties of HfTiO/InGaAs Gate Stack by Atomic-Layer-Deposition-Derived Al2O3 Passivation Layer 期刊论文
ACS APPLIED MATERIALS & INTERFACES, ACS APPLIED MATERIALS & INTERFACES, 2014, 卷号: Vol.6 No.24, 页码: 22013-22025
作者:  Sun,Zhaoqi;  Chen,Hanshuang;  Gao,Juan;  He,Gang;  Chen,Xiaoshuang
收藏  |  浏览/下载:2/0  |  提交时间:2019/04/24


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