On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping | |
Luo J(罗军); Liu JB(刘金彪); Eddy Simoen; Wang GL(王桂磊); Mao SJ(毛淑娟); Henry Homayoun Radamson; Duan NY(段宁远); Li JF(李俊峰); Wang WW(王文武) | |
刊名 | ECS Transactions |
2016 | |
文献子类 | 期刊论文 |
英文摘要 | In this work, the manipulation of phosphorus diffusion as well as the reduction of the specific contact resistivity in Ge by carbon co-doping is explored. It is found that there is an optimum condition for carbon implantation to suppress the rapid P diffusion effectively. For such a condition, the implanted carbon sits at the half range of the pre-amorphized Ge layer. In this case, both the diffusion of P in the amorphous layer and in the Ge virtual substrate beyond the amorphous/crystal (a/c) i |
内容类型 | 期刊论文 |
源URL | [http://159.226.55.106/handle/172511/16194] |
专题 | 微电子研究所_集成电路先导工艺研发中心 |
作者单位 | 中国科学院微电子研究所 |
推荐引用方式 GB/T 7714 | Luo J,Liu JB,Eddy Simoen,et al. On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping[J]. ECS Transactions,2016. |
APA | Luo J.,Liu JB.,Eddy Simoen.,Wang GL.,Mao SJ.,...&Wang WW.(2016).On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping.ECS Transactions. |
MLA | Luo J,et al."On the Manipulation of Phosphorus Diffusion as Well as the Reduction of Specific Contact Resistivity in Ge by Carbon Co-Doping".ECS Transactions (2016). |
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