Total Ionizing Dose Responses of Forward Body Bias Ultra-Thin Body and Buried Oxide FD-SOI Transistors | |
Zheng, QW (Zheng, Qiwen)[ 1 ]; Cui, JW (Cui, Jiangwei)[ 1 ]; Xu, LW (Xu, Liewei)[ 2 ]; Ning, BX (Ning, Bingxu)[ 3 ]; Zhao, K (Zhao, Kai)[ 3 ]; Shen, MJ (Shen, Mingjie)[ 3 ]; Yu, XF (Yu, Xuefeng)[ 1 ]; Lu, W (Lu, Wu)[ 1 ]; He, CF (He, Chengfa)[ 1 ]; Ren, DY (Ren, Diyuan)[ 1 ] | |
刊名 | IEEE TRANSACTIONS ON NUCLEAR SCIENCE |
2019 | |
卷号 | 66期号:4页码:702-709 |
关键词 | Back-gate biasing forward body bias (FBB) total ionizing dose (TID) ultrathin body and buried oxide fully depleted silicon-on-insulator (UTBB FD-SOI) |
ISSN号 | 0018-9499 |
DOI | 10.1109/TNS.2019.2901755 |
英文摘要 | This paper investigates the total ionizing dose (TID) responses of forward body bias (FBB) ultrathin body and buried oxide fully depleted silicon-on-insulator (UTBB FD-SOI) transistors, which are commonly used in commercial foundries. The experimental results demonstrate that TID-induced threshold voltage shift in FBB nMOSFET cannot be mitigated by applying biasing to back-gate (back-gate biasing). Bias condition dependence has also been explored, revealing that building up of the oxide-trapped charge (Not) in the buried oxide is affected by the electric field induced by the space charge. Moreover, the effect of threshold voltage option on TID responses of UTBB FD-SOI transistors with the undoped channel was first explored. Finally, the TID-enhanced back-gate biasing controlling of the threshold voltage was observed, which is a new phenomenon for the TID responses of UTBB FD-SOI transistors. |
WOS记录号 | WOS:000465237500003 |
内容类型 | 期刊论文 |
源URL | [http://ir.xjipc.cas.cn/handle/365002/5727] |
专题 | 新疆理化技术研究所_中国科学院特殊环境功能材料与器件重点试验室 新疆理化技术研究所_材料物理与化学研究室 |
作者单位 | 1.Chinese Acad Sci, Xinjiang Tech Inst Phys & Chem, Key Lab Funct Mat & Devices Special Environm, Urumqi 830011, Peoples R China 2.Fudan Univ, State Key Lab ASIC & Syst, Shanghai 201203, Peoples R China 3.Fudan Microelect Grp, Shanghai 200433, Peoples R China |
推荐引用方式 GB/T 7714 | Zheng, QW ,Cui, JW ,Xu, LW ,et al. Total Ionizing Dose Responses of Forward Body Bias Ultra-Thin Body and Buried Oxide FD-SOI Transistors[J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE,2019,66(4):702-709. |
APA | Zheng, QW .,Cui, JW .,Xu, LW .,Ning, BX .,Zhao, K .,...&Guo, Q .(2019).Total Ionizing Dose Responses of Forward Body Bias Ultra-Thin Body and Buried Oxide FD-SOI Transistors.IEEE TRANSACTIONS ON NUCLEAR SCIENCE,66(4),702-709. |
MLA | Zheng, QW ,et al."Total Ionizing Dose Responses of Forward Body Bias Ultra-Thin Body and Buried Oxide FD-SOI Transistors".IEEE TRANSACTIONS ON NUCLEAR SCIENCE 66.4(2019):702-709. |
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