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浏览/检索结果: 共5条，第1-5条 帮助 限定条件 内容类型：其他    专题：北京大学    第一署名单位    第一作者单位    通讯作者单位     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 TUNABLE METAMATERIALS FOR TERAHERTZ ULTRA-BROADBAND ABSORPTION DRIVEN BY MICROFLUIDICS 其他 2016-01-01 Song, Qing Hua; Cai, Hong; Gu, Yuan Dong; Wu, Pin Chieh; Zhang, Wu; Zhu, Wei Ming; Liang, Qing Xuan; Yang, Zhen Chuan; Jin, Yu Feng; Hao, Yu Long; Kwong, Dim-Lee; Bourouina, Tarik; Leprince-Wang, Yamin; Liu, Ai-Qun 收藏  |  浏览/下载：5/0  |  提交时间：2017/12/03 Tunable metamaterials for terahertz ultra-broadband absorption driven by microfluidics 其他 2016-01-01 Song, Qing Hua; Cai, Hong; Gu, Yuan Dong; Wu, Pin Chieh; Zhang, Wu; Zhu, Wei Ming; Liang, Qing Xuan; Yang, Zhen Chuan; Jin, Yu Feng; Hao, Yu Long; Kwong, Dim-Lee; Bourouina, Tarik; Leprince-Wang, Yamin; Liu, Ai-Qun 收藏  |  浏览/下载：4/0  |  提交时间：2017/12/03 A Tunable Metamaterial for Wide-Angle and Broadband Absorption through Meta-Water-Capsule Coatings 其他 2016-01-01 Song, Qinghua; Zhang, Wu; Cai, Hong; Gu, Yuan Dong; Wu, Pin Chieh; Zhu, Weiming; Liang, Qing Xuan; Yang, Zhenchuan; An, Yufeng; Hao, Yulong; Kwong, Dim-Lee; Bourouina, Tarik; Leprince-Wang, Yamin; Liu, Ai-Qun 收藏  |  浏览/下载：4/0  |  提交时间：2017/12/03 Composition Controlled Synthesis of Cu_(2-x)Se Nanocrystals by Tuning the Reactivity of SeO_2 Precursor and their Composition Dependent Plasmonic Properties 其他 2014-01-01 Jia-Wen Xiao; Shi-Xuan Fan; Zheng-Xu Wang; Mu Lin; Ling-Dong Sun; Chun-Hua Yan 收藏  |  浏览/下载：3/0  |  提交时间：2017/12/03 Controlled  plasmon  localized  photoelectron  oleic  extinction  tuning  Figure  reactivity  valence  Controlled  plasmon  localized  photoelectron  oleic  extinction  tuning  Figure  reactivity  valence   Feature-Scale Simulations of Particulate Slurry Flows in Chemical Mechanical Polishing by Smoothed Particle Hydrodynamics 其他 2014-01-01 Wang, Dong; Shao, Sihong; Yan, Changhao; Cai, Wei; Zeng, Xuan 收藏  |  浏览/下载：4/0  |  提交时间：2015/11/16 Chemical mechanical polishing  smoothed particle hydrodynamics  particulate flow  rough pad  wafer defects  abrasive concentration  MATERIAL REMOVAL RATE  NUMERICAL-SIMULATION  CONTACT-MECHANICS  MOLECULAR SCALE  FLUID PRESSURE  SPH  CMP  PLANARIZATION  MODEL  SIZE