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A novel method for fabricating micro-dimple arrays with good surface quality on metallic glass substrate by combining laser irradiation and mechanical polishing under wax sealing
期刊论文
JOURNAL OF MANUFACTURING PROCESSES, 2022, 卷号: 79, 页码: 911-923
作者:
Huang, Hu
;
Qian, Yongfeng
;
Zhang, Lin
;
Jiang, Minqiang
;
Yan, Jiwang
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2022/08/10
Metallic glass
Laser irradiation
Mechanical polishing
micro-dimple array
Surface quality
micro
nano-manufacturing
Nanosecond laser polishing of laser nitrided Zr-based metallic glass surface
期刊论文
International Journal of Advanced Manufacturing Technology, 2022, 卷号: 121, 期号: 5-6, 页码: 4099-4113
作者:
H. Huang
;
J. Hong
;
Y. F. Qian
;
C. Wang
;
Z. Y. Zhang and L. Zhang
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浏览/下载:0/0
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提交时间:2023/06/14
A comparative study on mechanical polishing and laser polishing of laser-nitrided Zr-based metallic glass surface
期刊论文
International Journal of Advanced Manufacturing Technology, 2022, 页码: 13
作者:
J. Hong
;
L. Zhang
;
Z. Y. Zhang
;
H. Huang and J. W. Yan
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浏览/下载:0/0
  |  
提交时间:2023/06/14
Design and test result of a superconducting double-spoke cavity
期刊论文
NUCLEAR ENGINEERING AND TECHNOLOGY, 2019, 卷号: 51, 期号: 3, 页码: 877-883
作者:
Yue, Weiming
;
Li, Chunlong
;
Xiong, Pingran
;
Huang, Yulu
;
Zhang, Shengxue
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  |  
浏览/下载:63/0
  |  
提交时间:2019/11/10
Multi-spoke
Superconducting cavity
RF design
Surface preparation
Cold test
Effect of geometry error on accuracy of large-diameter pads used for CMP dressing
期刊论文
International Journal of Advanced Manufacturing Technology, 2019, 卷号: 100, 页码: 1505-1520
作者:
Ban, X.X.
;
Zhao, H.Y.
;
Zhao, S.J.
;
Xie, R.Q.
;
Gu, Y.W.
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  |  
浏览/下载:14/0
  |  
提交时间:2019/11/19
Chemical mechanical polishing(CMP)
Geometry errors
Measured values
Polishing pads
Polyurethane pads
Profile accuracies
Spherical surface
Surface profiles
Physically-based modeling of pad-asperity scale chemical-mechanical synergy in chemical mechanical polishing
期刊论文
TRIBOLOGY INTERNATIONAL, 2019, 卷号: 138, 页码: 307-315
作者:
Wang, Lin
;
Zhou, Ping
;
Yan, Ying
;
Kang, Renke
;
Guo, Dongming
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  |  
浏览/下载:7/0
  |  
提交时间:2019/12/02
CMP
Pad asperity
Material removal rate
Chemical-mechanical synergy
Insights into the atomistic behavior in diamond chemical mechanical polishing with center dot OH environment using ReaxFF molecular dynamics simulation
期刊论文
COMPUTATIONAL MATERIALS SCIENCE, 2019, 卷号: 166, 页码: 136-142
作者:
Shi, Zhuoying
;
Jin, Zhuji
;
Guo, Xiaoguang
;
Yuan, Song
;
Guo, Jiang
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浏览/下载:5/0
  |  
提交时间:2019/12/02
Diamond
Chemical mechanical polishing
Removal mechanism
Molecular dynamics simulation
ReaxFF
Precision Fabrication of Thin Copper Substrate by Double-sided Lapping and Chemical Mechanical Polishing
期刊论文
JOURNAL OF MANUFACTURING PROCESSES, 2019, 卷号: 44, 页码: 47-54
作者:
Pan, Bo
;
Kang, Renke
;
Guo, Jiang
;
Fu, Haiyang
;
Du, Dongxing
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  |  
浏览/下载:42/0
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提交时间:2019/12/02
Double-sided lapping
Chemical mechanical polishing
Flatness
Surface integrity
Residual stress
Photochemically combined mechanical polishing of N-type gallium nitride wafer in high efficiency
期刊论文
PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY, 2019, 卷号: 55, 页码: 14-21
作者:
Ou, Li -Wei
;
Wang, Ya-Hui
;
Hu, Hui-Qing
;
Zhang, Liang-Liang
;
Dong, Zhi-Gang
收藏
  |  
浏览/下载:10/0
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提交时间:2019/12/02
Gallium nitride
Chemical mechanical polishing
Photo-assisted oxidation
Potassium persulfate
Material removal rate
Photoelectrochemically combined mechanical polishing of n-type gallium nitride wafer by using metal nanoparticles as photocathodes
期刊论文
International Journal of Advanced Manufacturing Technology, 2019
作者:
Ou, L.
;
Dong, Z.
;
Kang, R.
;
Shi, K.
;
Guo, D.
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  |  
浏览/下载:5/0
  |  
提交时间:2019/12/02
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