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合肥物质科学研究院 [18]
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期刊论文 [18]
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2019 [1]
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2017 [7]
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专题:合肥物质科学研究院
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Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 778, 期号: 无, 页码: 579-587
作者:
Wang, Die
;
He, Gang
;
Liang, Shuang
;
Liu, Mao
收藏
  |  
浏览/下载:56/0
  |  
提交时间:2020/03/31
Dy2O3 gate dielectrics
High-k
Annealing temperature
Optical properties
Electrical characteristics
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD-Derived Al2O3 Passivation Layer and Forming Gas Annealing
期刊论文
ADVANCED ELECTRONIC MATERIALS, 2018, 卷号: 4, 期号: 4, 页码: 9
作者:
Jiang, Shanshan
;
He, Gang
;
Liu, Mao
;
Zhu, Li
;
Liang, Shuang
收藏
  |  
浏览/下载:65/0
  |  
提交时间:2019/06/10
electrical properties
forming gas annealing
high-k gate dielectrics
interface chemistry
metal-oxide-semiconductor capacitors
Interface chemistry and electronic structure of ALD-derived HfAlO/Ge gate stacks revealed by X-ray photoelectron spectroscopy
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 716, 期号: 无, 页码: 1-6
作者:
He, Gang
;
Jiang, Shanshan
;
Li, Wendong
;
Zheng, Changyong
;
He, Huaxin
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  |  
浏览/下载:38/0
  |  
提交时间:2018/05/25
High-k Gate Dielectric
Atomic-layer-deposition
Interface Stability
Phase Separation
Annealing Temperature
Annealing temperature-dependent microstructure and optical and electrical properties of solution-derived Gd-doped ZrO2 high-k gate dielectrics
期刊论文
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 2017, 卷号: 83, 期号: 3, 页码: 675-682
作者:
Zhu, L.
;
He, G.
;
Sun, Z. Q.
;
Liu, M.
;
Jiang, S. S.
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  |  
浏览/下载:24/0
  |  
提交时间:2018/08/16
Gd-doped Zro2 Gate Dielectric Thin Films
Annealing Temperature
Sol-gel
Optical Properties
Electrical Properties
Modulation of interfacial and electrical properties of HfGdO/GaAs gate stacks by ammonium sulfide passivation and rapid thermal annealing
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 704, 期号: 无, 页码: 322-328
作者:
Jiang, S. S.
;
He, G.
;
Liang, S.
;
Zhu, L.
;
Li, W. D.
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  |  
浏览/下载:20/0
  |  
提交时间:2018/07/04
High-k Gate Dielectrics
Interface Chemistry
Xps Electrical Properties
Cmos Devices
Interfacial modulation and electrical properties improvement of solution-processed ZrO2 gate dielectrics upon Gd incorporation
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 699, 期号: 无, 页码: 415-420
作者:
Xiao, D. Q.
;
He, G.
;
Lv, J. G.
;
Wang, P. H.
;
Liu, M.
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  |  
浏览/下载:14/0
  |  
提交时间:2018/07/04
High-k Gate Dielectrics
Gd Incorporation
Xps
Electrical Properties
Sol-gel
Interface quality modulation, band alignment modification and optimization of electrical properties of HfGdO/Ge gate stacks by nitrogen incorporation
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 695, 期号: 无, 页码: 2199-2206
作者:
Gao, J.
;
He, G.
;
Fang, Z. B.
;
Lv, J. G.
;
Liu, M.
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  |  
浏览/下载:16/0
  |  
提交时间:2018/07/04
High-k Gate Dielectrics
Interface Quality
Band Alignment
Electrical Properties
Leakage Current Mechanism
Annealing-temperature-modulated optical, electrical properties, and leakage current transport mechanism of sol-gel-processed high-k HfAlOX gate dielectrics
期刊论文
CERAMICS INTERNATIONAL, 2017, 卷号: 43, 期号: 3, 页码: 3101-3106
作者:
Jin, P.
;
He, G.
;
Fang, Z. B.
;
Liu, M.
;
Xiao, D. Q.
收藏
  |  
浏览/下载:19/0
  |  
提交时间:2018/07/04
High-k Hfalox Gate Dielectrics
Sol-gel
Optical Properties
Electrical Properties
Leakage Current Transport Mechanism
Modulation of interfacial and electrical properties of ALD-derived HfAlO/Al2O3/Si gate stack by annealing temperature
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 691, 期号: 无, 页码: 504-513
作者:
Gao, J.
;
He, G.
;
Liu, M.
;
Lv, J. G.
;
Sun, Z. Q.
收藏
  |  
浏览/下载:18/0
  |  
提交时间:2017/11/21
High-k Dielectric
Interface Thermal Stability
Atomic-layer-deposition
Band Alignment
Electrical Properties
Leakage Current Mechanism
Baking-temperature-modulated optical and electrical properties of HfTiOx gate dielectrics via sol-gel method
期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 卷号: 688, 期号: 无, 页码: 925-932
作者:
Jin, P.
;
He, G.
;
Wang, P. H.
;
Liu, M.
;
Xiao, D. Q.
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  |  
浏览/下载:57/0
  |  
提交时间:2017/09/11
High-k Gate Dielectrics
Hftiox Thin Films
Sol-gel Processing
Optical Properties
Electrical Properties
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