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长春光学精密机械与... [16]
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专题:长春光学精密机械与物理研究所
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Luminescence lifetime enhanced by exciton-plasmon couple in hybrid CsPbBr3 perovskite Pt nanostructure
期刊论文
Materials Research Express, 2018, 卷号: 5, 期号: 2, 页码: 9
作者:
Liu, C. X.
;
Zhang, J. S.
;
Chen, Y. Y.
;
Jing, P. T.
;
Zhang, L. G.
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/09/17
hybrid CsPbBr3 perovskite/Pt
exciton-plasmon couple
energy transfer
lifetime enhancement
semiconductor quantum-dot
metal nanoparticles
gold nanoparticles
fluorescence
photoluminescence
emission
suppression
polaritons
overlap
cdse
Materials Science
Luminescence Lifetime Enhanced by Exciton-plasmon Couple in Hybrid CsPbBr3Perovskite/Pt Nanostructure
期刊论文
Faguang Xuebao/Chinese Journal of Luminescence, 2017, 卷号: 38, 期号: 12
作者:
Liu, C.-X.
;
J.-S. Zhang
;
Y.-Y. Chen
;
P.-T. Jing
;
L.-G. Zhang
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2018/06/13
Effect of oxygen partial pressure and anneal temperature: On BaTiO3thin film crystal structure
会议论文
International Symposium on Photonics and Optoelectronics, Shanghai, August 22
作者:
Zhang, Jing
;
Sun, De-Gui
;
Fu, Xiuhua
;
Liu, Dong-Mei
;
Pan, Yong-Gang
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2016/07/18
Novel cell parameter determination of a twisted-nematic liquid crystal display
期刊论文
Chinese Physics B, 2008, 卷号: 17, 期号: 3, 页码: 950-953
Huang X.
;
Jing H.
;
Fu G. Z.
收藏
  |  
浏览/下载:9/0
  |  
提交时间:2012/10/21
The effect of N/Si ratio on the a-SiiH/SiNx interface of a-SirH/SiNx TFT (EI CONFERENCE)
会议论文
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Liu J. e.
;
Gao W.
;
Liao Y.
;
Jing H.
;
Fu G.
收藏
  |  
浏览/下载:18/0
  |  
提交时间:2013/03/25
The threshold voltage of a-Si: H/SiNx TFT will shift under long time gate bias stress
it is mostly leaded by charge trapping in gate insulator and defect creation in semiconductor. And it is hard to be applied in AMOLED for TFT because of its threshold voltage shift. In allusion to the phenomenon of charge trapping
a series of SiNx insulating films in different N/Si(0. 87 -1.68) ratio were deposited by PECVD in this paper
controlling different flow ratio of source gas SiH4 and NH3
and a great deal of tests (ellipsometer
infrared absorption (FTIR) and Electron Dispersion Spectrum (EDS) test ) were done on these samples. Based on these SiNx insulators
three different capacitance samples in MIS structure were done
degraded experiments and C-V tests on these samples were done. The C-V curve shift of capacitance which contained SiNx with slightly N-rich(N/Si is bigger slightly than 1. 33) was not evident before and after degradation
this result indicated that the defect density of this type SiN x was smaller
and could restrain charge chapping in the interface of a-Si:H/SiNx effectively. So that as gate insulator of TFT
SiN x with slightly N-rich could decrease the threshold voltage shift of TFT and enhance its stability effectively.
Novel fast measurement method of twist angle and optical retardation of liquid crystal display
会议论文
2007
Huang X.
;
Lu Y. T.
;
Kong X. J.
;
Jing H.
;
Fu G. Z.
;
Jin H.
;
East China Normal Unviersity P.
收藏
  |  
浏览/下载:9/0
  |  
提交时间:2013/03/28
The effect of N/Si ratio on the a-Si : H/SiNx interface of a-Si : H/SiNx TFT
会议论文
2007
Liu J. E.
;
Gao W. T.
;
Liao Y. P.
;
Jing H.
;
Fu G. Z.
;
East China Normal Unviersity P.
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2013/03/28
Study of the fabrication of ZnO-TFT (EI CONFERENCE)
会议论文
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Wang C.
;
Yang X. T.
;
Zhu H. C.
;
Ma X. M.
;
Fu G. Z.
;
Jing H.
;
Chang Y. C.
;
Du G. T.
收藏
  |  
浏览/下载:18/0
  |  
提交时间:2013/03/25
Znic Oxide (ZnO) as a shorter wavelength luminescent material concerning its outstanding properties of a wide band-gap semiconductor
it can be used as the active channel layer to fabricate thin film transistor (TFT) and transparent thin film transistor(TTFT). In this paper
we introduced ZnO-TFT using different substrate material
insulator material
electrode material of gate
source and drain in its device.
Novel fast measurement method of twist angle and optical retardation of liquid crystal display (EI CONFERENCE)
会议论文
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Huang X.
;
Lu Y.-T.
;
Kong X.-J.
;
Jing H.
;
Fu G.-Z.
;
Jin H.
收藏
  |  
浏览/下载:12/0
  |  
提交时间:2013/03/25
A novel method is proposed to measure twist angle and optical retardation of liquid crystal display in this paper. The new method which is one of single-wavelength methods has three characteristics
introducing a method of measuring the total intensity ratio of the transmitted light to eliminate the influence of absorption by the polarizer
using circularly and homogeneously aligned LC cell (CH-LC) as a unique polarization-converting device
analyzer
using variable sector diaphragm and photodetector to detect the total intensity of transmitted light whose original polarization direction is continuously changed from 0 to arbitrary angle
CH-LC
liquid crystal display and so on. The twist angle () and optical retardation (nd) can be derived by using Jones matrix analysis and a curve fitting where and nd are fitting parameters. Experiment proved the results are accurate
the process of operation is fast
the devices are economical.
The fabrication and study of ZnO-based thin film transistors (EI CONFERENCE)
会议论文
Asia Display 2007, AD'07, March 12, 2007 - March 16, 2007, Shanghai, China
Yang X. T.
;
Ma X. M.
;
Zhu H. C.
;
Gao W. T.
;
Jin H.
;
Qi X. W.
;
Gao B.
;
Dong X. R.
;
Fu G. Z.
;
Jing H.
;
Wang C.
;
Chang Y. C.
;
Du G. T.
;
Cao J. L.
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2013/03/25
Bottom-gate-type thin film transistors using ZnO as an active channel layer (ZnO-TF-TS) have been constructed. The ZnO layers were deposited using metal organic chemical vapor deposition (MOCVD)[1-3] at about 360C. SiO2 was used as the material of gate insulator to suppress the leakage current effectively and to enable the ZnO-TFT to operate successfully. The drain current on-to-off ratio of ZnO-TFTs fabricated on the substrate of glass is about 104. The average optical transmission of ZnO-TFTs in the visible portion is 80%. All above shows that it is possible to fabricate a transparent TFT using ZnO as an active channel layer instead of the traditional Si material.
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