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浏览/检索结果: 共7条，第1-7条 帮助 已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 An Optimized Majority Logic Synthesis Methodology for Quantum-Dot Cellular Automata 期刊论文 IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2010, 卷号: 9, 期号: 2, 页码: 170-183 作者:  Kong, Kun;  Shang, Yun;  Lu, Ruqian 收藏  |  浏览/下载：13/0  |  提交时间：2018/07/30 Majority networks  minimum cost  quantum-dot cellular automata (QCA)  redundancy removal   An Optimized Majority Logic Synthesis Methodology for Quantum-Dot Cellular Automata 期刊论文 IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2010, 卷号: 9, 期号: 2, 页码: 170-183 作者:   收藏  |  浏览/下载：10/0  |  提交时间：2019/12/16 Majority networks  minimum cost  quantum-dot cellular automata (QCA)  redundancy removal   Random 2-D layout decomposition and synthesis using self-aligned multiple patterning and stitching techniques (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：2/0  |  提交时间：2019/04/11 Self-aligned multiple patterning  Layout decomposition and synthesis  Stitching   Layout Decomposition and Synthesis for a Modular Technology to Solve the Edge-Placement Challenges by Combining Selective Etching, Direct Sti (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Han, Ting[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：12/0  |  提交时间：2019/04/11 edge-placement errors (EPE)  selective etching  alternating-material (dual-material) self-aligned multiple patterning (altSAMP)  alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP)  direct stitching  layout decomposition and synthesis   Cut-hole layout decomposition and synthesis to reduce the effect of edge-placement errors (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Han, Ting[1];  Chen, Yijian[1] 收藏  |  浏览/下载：8/0  |  提交时间：2019/04/11 Edge-placement errors  Selective etching  Alternating-material self-aligned multiple patterning  Layout decomposition and synthesis   Breaking Through 1-D Layout Limitations and Regaining 2-D Design Freedom Part I: 2-D Layout Decomposition and Stitching Techniques for Hybrid (CPCI-S收录) 会议 作者:  Liu, Hongyi[1];  Zhou, Jun[1];  Chen, Yijian[1] 收藏  |  浏览/下载：10/0  |  提交时间：2019/04/11 self-aligned multiple patterning (SAMP)  positive-tone self-aligned sextuple patterning (pSASP)  hybrid SAMP  stitching  layout decomposition and synthesis   Mask Strategy and Layout Decomposition for Self-Aligned Quadruple Patterning (CPCI-S收录) 会议论文 DESIGN FOR MANUFACTURABILITY THROUGH DESIGN-PROCESS INTEGRATION VII 作者:  Kang, Weiling[1];  Feng, Chen;  Chen, Yijian[1] 收藏  |  浏览/下载：2/0  |  提交时间：2019/04/15 Self-aligned quadruple patterning (SAQP)  spacer-expansion mask  layout decomposition/synthesis  negative tone  conflicting graph