Layout Decomposition and Synthesis for a Modular Technology to Solve the Edge-Placement Challenges by Combining Selective Etching, Direct Sti (CPCI-S收录) | |
Liu, Hongyi[1]; Han, Ting[1]; Zhou, Jun[1]; Chen, Yijian[1] | |
关键词 | edge-placement errors (EPE) selective etching alternating-material (dual-material) self-aligned multiple patterning (altSAMP) alternating-material (dual-material) self-aligned quadruple/sextuple patterning (altSAQP/altSASP) direct stitching layout decomposition and synthesis |
URL标识 | 查看原文 |
内容类型 | 会议 |
URI标识 | http://www.corc.org.cn/handle/1471x/2039578 |
专题 | 华南理工大学 |
推荐引用方式 GB/T 7714 | Liu, Hongyi[1],Han, Ting[1],Zhou, Jun[1],等.Layout Decomposition and Synthesis for a Modular Technology to Solve the Edge-Placement Challenges by Combining Selective Etching, Direct Sti (CPCI-S收录). |
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