×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
西安交通大学 [3]
兰州大学 [3]
光电技术研究所 [3]
兰州理工大学 [2]
华南理工大学 [2]
上海光学精密机械研究... [2]
更多...
内容类型
会议论文 [22]
发表日期
2020 [2]
2017 [2]
2016 [1]
2013 [1]
2012 [1]
2011 [3]
更多...
学科主题
其他 [2]
computer t... [1]
crystal gr... [1]
engineerin... [1]
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共22条,第1-10条
帮助
限定条件
内容类型:会议论文
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
Optimization of ultra-high temperature antioxidation coating for C/SiC nozzle
会议论文
Suzhou, China, May 1, 2020 - May 3, 2020
作者:
Kaifeng, Zhang
;
Shengzhu, Cao
;
Yanlong, Yang
;
Yuqing, Xiong
;
Hui, Zhou
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2020/11/15
Ablation
Coatings
Electron devices
Hafnium oxides
Nozzles
Numerical methods
Silicon
Silicon carbide
Ablation resistance
Anti-oxidation coatings
Composite coating films
High temperature
Mechanical erosion
Quaternary systems
Ultrahigh temperature
Vulnerable area
Effects of yttrium on wettability and interactions between molten superalloy and SiO2-based ceramic core
会议论文
作者:
Zi, Yun
;
Meng, Jie
;
Zou, Mingke
;
Xu, Wei
;
Li, Jinguo
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2020/12/18
Alumina
Aluminum oxide
Hafnium oxides
Silica
Silicon
Superalloys
Wetting
Yttrium
Yttrium aluminum garnet
ZirconiaHigh quality
High temperature
Interface reactions
SiO2-based ceramic core
Superalloy castings
Wetting angle
Y3Al5O12
Compliance Current Effect on Switching Behavior of Hafnium Oxide based RRAM
会议论文
作者:
Qi, Yanfei
;
Zhao, Chun
;
Fang, Yuxiao
;
Lu, Qifeng
;
Liu, Chenguang
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/11/26
Preparation and damage characteristics of broad bandwidth HR films for picoseconds laser system
会议论文
作者:
Long, Guoyun
;
Zhang, Yaoping
;
Fan, Junqi
收藏
  |  
浏览/下载:22/0
  |  
提交时间:2018/12/20
Bandwidth - Dielectric materials - Film preparation - Hafnium oxides - Multilayer films - Multilayers - Niobium oxide - Refractive index
Total-Dose Radiation Response and and Post-Irradiation Annealing Response of Hafnium Capacitors
会议论文
作者:
Liu, Xin
;
Lei, Yuqiu
;
Cheng, Yonghong
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/11/26
HfO2
post-irradiation annealing
radiation effect
MOS capacity
Optimization of HfO2 growth process by atomic layer deposition (ALD) for high performance charge trapping flash memory application
会议论文
China Semiconductor Technology International Conference 2013, CSTIC 2013, Shanghai, China, March 19, 2013 - March 21, 2013
作者:
Chen, GuoXing
;
Huo, Zongliang
;
Zhao, ShengJie
;
Yang, Xiaonan
;
Liu, ZiYu
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2017/01/20
Atomic layer deposition
Charge trapping
Deposition
Flash memory
Hafnium oxides
Physisorption
Semiconductor device manufacture
Charge trapping memory
Charge-trapping flashes
Deposition temperatures
Future designs
Memory applications
Memory performance
Process parameters
Trapping layers
Effects of Oxygen Partial Pressure on the Sputtered Hafnium Oxide Thin Films for Resistive Random-Access Memory
会议论文
作者:
Xie, Zhongliang
;
Lai, Yunfeng
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2019/11/21
RE Reactive Magnetron Sputtering
Resistance Change
RRAM
Hafnium Oxide
Dummy Poly Silicon Gate Removal by Wet Chemical Etching
会议论文
作者:
Yang T(杨涛)
收藏
  |  
浏览/下载:14/0
  |  
提交时间:2012/11/19
Development of superconducting tunnel junction photon detector using Hafnium
会议论文
Chicago, IL, USA, 2011
作者:
Shin-Hong Kim
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2017/11/10
Characterization of hafnia thin films made with different deposition technologies
会议论文
Proc. of SPIE, 2011
作者:
Wanjun Ai
;
Shengming Xiong
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2016/11/25
©版权所有 ©2017 CSpace - Powered by
CSpace