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High Mobility MoS2 Transistor with Low Schottky Barrier Contact by Using Atomic Thick h-BN as a Tunneling Layer 期刊论文
ADVANCED MATERIALS, 2016, 卷号: 28, 期号: 37
作者:  Wang, JL;  Yao, Q;  Huang, CW;  Zou, XM;  Liao, L
收藏  |  浏览/下载:14/0  |  提交时间:2017/03/11


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