Hot-carrier effects on irradiated deep submicron NMOSFET
Cui, Jiangwei; Zheng, Qiwen; Yu, Xuefeng; Cong, Zhongchao; Zhou, Hang; Guo, Qi; Wen, Lin; Wei, Ying; Ren, Diyuan
刊名Journal of Semiconductors
2014
卷号35期号:7
ISSN号16744926
英文摘要We investigate how γ exposure impacts the hot-carrier degradation in deep submicron NMOSFET with different technologies and device geometries for the first time. The results show that hot-carrier degradations on irradiated devices are greater than those without irradiation, especially for narrow channel device. The reason is attributed to charge traps in STI, which then induce different electric field and impact ionization rates during hot-carrier stress.
收录类别EI
公开日期2014-11-11
内容类型期刊论文
源URL[http://ir.xjipc.cas.cn/handle/365002/3920]  
专题新疆理化技术研究所_中国科学院特殊环境功能材料与器件重点试验室
新疆理化技术研究所_材料物理与化学研究室
作者单位Key Laboratory of Functional Materials and Devices under Special Environments, Chinese Academy of Sciences, Xinjiang Technical Institute of Physics and Chemistry, Urumuqi 830011, China;University of Chinese Academy of Sciences, Beijing 100049, China
推荐引用方式
GB/T 7714
Cui, Jiangwei,Zheng, Qiwen,Yu, Xuefeng,et al. Hot-carrier effects on irradiated deep submicron NMOSFET[J]. Journal of Semiconductors,2014,35(7).
APA Cui, Jiangwei.,Zheng, Qiwen.,Yu, Xuefeng.,Cong, Zhongchao.,Zhou, Hang.,...&Ren, Diyuan.(2014).Hot-carrier effects on irradiated deep submicron NMOSFET.Journal of Semiconductors,35(7).
MLA Cui, Jiangwei,et al."Hot-carrier effects on irradiated deep submicron NMOSFET".Journal of Semiconductors 35.7(2014).
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