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Doping Concentration Modulation in Vanadium-Doped Monolayer Molybdenum Disulfide for Synaptic Transistors
Zou, Jingyun2,3; Cai, Zhengyang2,3; Lai, Yongjue2,3; Tan, Junyang2,3; Zhang, Rongjie2,3; Feng, Simin2,3; Wang, Gang4; Lin, Junhao4; Liu, Bilu2,3; Cheng, Hui-Ming1,2,3
刊名ACS NANO
2021-04-27
卷号15期号:4页码:7340-7347
关键词2D materials molybdenum disulfide MoS2 vanadium substitutional doping synaptic transistor
ISSN号1936-0851
DOI10.1021/acsnano.1c00596
通讯作者Liu, Bilu(bilu.liu@sz.tsinghua.edu.cn) ; Cheng, Hui-Ming(hmcheng@sz.tsinghua.edu.cn)
英文摘要Doping is an effective way to modify the electronic property of two-dimensional (2D) materials and endow them with additional functionalities. However, wide-range control of the doping concentrations in monolayer 2D materials with large-scale uniformity remains challenging. Here, we report in situ chemical vapor deposition growth of vanadium-doped monolayer molybdenum disulfide (MoS2) with widely tunable doping concentrations ranging from 0.3 to 13.1 atom %. The key to regulate the doping concentration lies in the use of appropriate vanadium precursors with different doping abilities, which also generate large-scale uniform doping to MoS2. Artificial synaptic transistors were fabricated using the heavily doped MoS2 as the channel material. Synaptic potentiation, depression, and repetitive learning processes were mimicked by the gate-tunable changes of channel conductance in such transistors with abundant vanadium atoms to trap/detrap electrons. This work develops a feasible method to dope monolayer 2D semiconductors and demonstrates their applications in artificial synaptic transistors.
资助项目National Natural Science Foundation of China[51920105002] ; National Natural Science Foundation of China[51991340] ; National Natural Science Foundation of China[51991343] ; National Natural Science Foundation of China[51722206] ; National Natural Science Foundation of China[11974156] ; Youth 1000-Talent Program of China, Guangdong Innovative and Entrepreneurial Research Team Program[2017ZT07C341] ; Youth 1000-Talent Program of China, Guangdong Innovative and Entrepreneurial Research Team Program[2019ZT08C044] ; Bureau of Industry and Information Technology of Shenzhen[201901171523] ; Shenzhen Basic Research Project[JCYJ20200109144620815] ; Shenzhen Basic Research Project[JCYJ20200109144616617] ; Shenzhen Basic Research Project[KQTD20190929173815000] ; Presidential fund ; Development and Reform Commission of Shenzhen Municipality
WOS研究方向Chemistry ; Science & Technology - Other Topics ; Materials Science
语种英语
出版者AMER CHEMICAL SOC
WOS记录号WOS:000645436800119
资助机构National Natural Science Foundation of China ; Youth 1000-Talent Program of China, Guangdong Innovative and Entrepreneurial Research Team Program ; Bureau of Industry and Information Technology of Shenzhen ; Shenzhen Basic Research Project ; Presidential fund ; Development and Reform Commission of Shenzhen Municipality
内容类型期刊论文
源URL[http://ir.imr.ac.cn/handle/321006/161573]  
专题金属研究所_中国科学院金属研究所
通讯作者Liu, Bilu; Cheng, Hui-Ming
作者单位1.Chinese Acad Sci, Inst Met Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
2.Tsinghua Univ, Shenzhen Geim Graphene Ctr, Tsinghua Shenzhen Int Grad Sch, Tsinghua Berkeley Shenzhen Inst, Shenzhen 518055, Peoples R China
3.Tsinghua Univ, Inst Mat Res, Tsinghua Shenzhen Int Grad Sch, Shenzhen 518055, Peoples R China
4.Southern Univ Sci & Technol, Dept Phys, SUSTech Core Res Facil, Shenzhen 518055, Peoples R China
推荐引用方式
GB/T 7714
Zou, Jingyun,Cai, Zhengyang,Lai, Yongjue,et al. Doping Concentration Modulation in Vanadium-Doped Monolayer Molybdenum Disulfide for Synaptic Transistors[J]. ACS NANO,2021,15(4):7340-7347.
APA Zou, Jingyun.,Cai, Zhengyang.,Lai, Yongjue.,Tan, Junyang.,Zhang, Rongjie.,...&Cheng, Hui-Ming.(2021).Doping Concentration Modulation in Vanadium-Doped Monolayer Molybdenum Disulfide for Synaptic Transistors.ACS NANO,15(4),7340-7347.
MLA Zou, Jingyun,et al."Doping Concentration Modulation in Vanadium-Doped Monolayer Molybdenum Disulfide for Synaptic Transistors".ACS NANO 15.4(2021):7340-7347.
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