| Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors | |
| Zhao, Xurong; Wang, Sumei; Li, Aiju; Ouyang, Jun; Xia, Guodong; Zhou, Ji | |
| 刊名 | RSC ADVANCES
 |
| 2014 | |
| 卷号 | 4期号:29页码:14890-14895 |
| DOI | 10.1039/c4ra00633j |
| URL标识 | 查看原文 |
| 内容类型 | 期刊论文 |
| URI标识 | http://www.corc.org.cn/handle/1471x/4797343 |
| 专题 | 山东大学 |
| 作者单位 | Shandong Univ, Minist Educ, Key Lab Liquid Solid Struct Evolut & Proc Mat, Jinan 250061, Peoples R |
| 推荐引用方式 GB/T 7714 | Zhao, Xurong,Wang, Sumei,Li, Aiju,et al. Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors[J]. RSC ADVANCES,2014,4(29):14890-14895. |
| APA | Zhao, Xurong,Wang, Sumei,Li, Aiju,Ouyang, Jun,Xia, Guodong,&Zhou, Ji.(2014).Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors.RSC ADVANCES,4(29),14890-14895. |
| MLA | Zhao, Xurong,et al."Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors".RSC ADVANCES 4.29(2014):14890-14895. |
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