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Inner surface device for microwave plasma-based low-energy ion implantation metal round pipe has assisting heating source coaxially arranged on outer part of processed metal pipe and uniformly heated in circumferential direction. 专利
申请日期: 2010-01-01, 公开日期: 2010-05-26
作者:  GAO F LEI M OU Y WU Z
收藏  |  浏览/下载:4/0  |  提交时间:2019/12/24
Large area direct current (DC) pulse plasma base low energy implantation device for use in material surface engineering has low energy ion implantation power supply which outputs predetermined DC pulse negative bias voltage on sample table. 专利
申请日期: 2007-01-01, 公开日期: 2007-10-03
作者:  LEI M GUO J GAO F YUAN L ZHANG Z
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/27
Elemental sulphur ion composite implantation - for high precision parts in astronautics and mechanical engineering. 专利
申请日期: 1994-01-01, 公开日期: 1994-04-06
作者:  LI G WEN X SHI W
收藏  |  浏览/下载:1/0  |  提交时间:2020/01/06


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