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CORC

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Deposition and Growth Mechanism of Low-Temperature Crystalline Silicon Films on Inexpensive Substrates 会议论文
Korea-China Symposium on Advanced Functional Films for Information, Incheon, SOUTH KOREA, SEP 28-OCT 02, 2008
作者:  He, DY;  Yin, M;  Wang, JX;  Gao, PQ;  Li, JS
收藏  |  浏览/下载：5/0  |  提交时间：2015/07/31
Low-temperature deposition of highly crystallized silicon films on Al-coated polyethylene napthalate by inductively coupled plasma CVD 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 卷号: 481, 期号: 1-2, 页码: 278-282
作者:  Wang, JX;  Gao, PQ;  Yin, M;  Qin, YL;  Yan, HQ
收藏  |  浏览/下载：5/0  |  提交时间：2015/05/25
Regulation of the plasma membrane during exposure to low temperatures in suspension-cultured cells from a cryophyte (Chorispora bungeana) 期刊论文
PROTOPLASMA, 2008, 卷号: 232, 期号: 3-4, 页码: 173-181
作者:  Shi, YL;  An, LZ;  Zhang, MX;  Huang, CH;  Zhang, H
收藏  |  浏览/下载：1/0  |  提交时间：2015/12/14
Structure and optical properties of Si films deposited by inductively coupled plasma CVD at room temperature 会议论文
作者:  Xiaoqiang, Wang;  Deyan, He;  Junshuai, Li
收藏  |  浏览/下载：2/0  |  提交时间：2017/01/20
Effect of H-2 on polycrystalline si films deposited by plasma-enhanced CVD using ar-diluted SiH4 期刊论文
ACTA PHYSICA SINICA/物理学报, 2006, 卷号: 55, 期号: 11, 页码: 5959-5963
作者:  Qi, J;  Jin, J;  Hu, HL;  Gao, PQ;  Yuan, BH
收藏  |  浏览/下载：3/0  |  提交时间：2015/05/25
Electron field emission from nano-crystalline Si films deposited by inductively coupled plasma CVD at room temperature 期刊论文
CHINESE SCIENCE BULLETIN, 2006, 卷号: 51, 期号: 5, 页码: 510-514
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收藏  |  浏览/下载：2/0  |  提交时间：2015/05/25
Al-induced crystallization during low-temperature deposition of Si films by inductively coupled plasma CVD 会议论文
11th China-Korea Symposium on Thin Film Materials, Chengdu, PEOPLES R CHINA, JUN 28-JUL 05, 2004
作者:  He, DY;  Wang, XQ;  Chen, Q;  Li, JS
收藏  |  浏览/下载：2/0  |  提交时间：2015/07/31
Al诱导a-Si:H薄膜的晶化 期刊论文
真空科学与技术学报/Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2005, 卷号: 25, 期号: 1, 页码: 57-60
作者:  祁菁;  金晶;  胡海龙;  贺德衍
收藏  |  浏览/下载：3/0  |  提交时间：2015/04/27
Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD 期刊论文
ACTA PHYSICA SINICA/物理学报, 2005, 卷号: 54, 期号: 1, 页码: 269-273
作者:  Wang, XQ;  Li, JS;  Chen, Q;  Qi, J;  Yin, M
收藏  |  浏览/下载：5/0  |  提交时间：2015/05/25
Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasma 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 卷号: 22, 期号: 6, 页码: 2419-2423
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收藏  |  浏览/下载：2/0  |  提交时间：2015/05/25

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