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浏览/检索结果: 共1条，第1-1条 帮助 限定条件 专题：兰州大学    第一署名单位    第一作者单位    通讯作者单位     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Near-field diffraction simulation on three-dimensional mask model with off-axis illumination 会议论文 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, Chengdu, China, November 19, 2008 - November 21, 2008 作者:  Cheng, Lin;  Cao, Peng-Fei;  Liu, Jia;  Zhang, Xiao-Ping 收藏  |  浏览/下载：3/0  |  提交时间：2017/01/18 Three dimensional  Design  Diffraction  Electromagnetic fields  Electron beam lithography  Manufacture  Optical beam splitters  Optical instruments  Photolithography  Simulators  Testing  3-D defects  3D masks  45nm technology  Azimuth angles  Contact holes  Electromagnetic field simulation  Hyper-NA  Incident angles  Key issues  Lithography simulation  Mask topography effect  Near-field diffraction  Near-field distribution  Oblique incidence angles  Off-axis illumination  Optical proximity corrections  Printing performance  Scalar diffraction theory  Three-dimensional (3-D) simulation  Three-dimensional model