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科研机构
兰州理工大学 [9]
内容类型
期刊论文 [7]
会议论文 [2]
发表日期
2022 [3]
2020 [1]
2016 [3]
2012 [2]
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Lanthanum activated palygorskite for selective phosphate separation from aqueous media: Comprehensive understanding of adsorptive behavior and mechanism affected by interfering substances
期刊论文
Chemical Engineering Journal, 2022, 卷号: 443
作者:
Mi, Xiao
;
Yu, Fan
;
Zhang, Huining
;
Chen, Rongfan
;
Hu, Xiaoling
收藏
  |  
浏览/下载:31/0
  |  
提交时间:2022/06/20
Adsorption
Etching
Eutrophication
Lanthanum compounds
Separation
Active site
Adsorption behaviour
Alkalines
Aqueous media
Co-existing
Co-existing substance
Interfering substances
Palygorskites
Phosphate separation
Waterbodies
Corrosion Behavior of Aluminum-Forming Alloy 310S for Application in Molten Chloride Salt CSP Thermal Storage Tank
期刊论文
FRONTIERS IN MATERIALS, 2022, 卷号: 9
作者:
Wei, Ying
;
La, Peiqing
;
Jin, Jing
;
Du, Mingchen
;
Zheng, Yuehong
收藏
  |  
浏览/下载:17/0
  |  
提交时间:2022/06/21
aluminum-forming alloy
concentrated solar power
corrosion
molten salt
chloride
passivation
Cation substituted Ni3S2 nanosheets wrapped Zn0.76Co0.24S nanowire arrays prepared with in-situ oxidative etching strategy for high performance solid-state asymmetric supercapacitors
期刊论文
JOURNAL OF ENERGY STORAGE, 2022, 卷号: 46
作者:
Jia, Henan
;
Fan, Jiahang
;
Fan, Yuewen
;
Feng, Chenchen
;
Jin, Haize
收藏
  |  
浏览/下载:33/0
  |  
提交时间:2022/03/01
In-situ oxidative etching
Core-shell
Zn0.76Co0.24S
Ni3S2
Supercapacitor
Simulation of Discharge Characteristics for the Plasma Etching of Large Area SiO2 Substrates
期刊论文
JOURNAL OF RUSSIAN LASER RESEARCH, 2020, 卷号: 41, 期号: 3, 页码: 258-267
作者:
Zhang JW(张景文)
收藏
  |  
浏览/下载:11/0
  |  
提交时间:2020/11/30
reactive ion etching
capacitive coupled discharge
fluid simulation
discharge parameter
large area SiO2 substrates
plasma radial uniformity
The immunity of doping-less junctionless transistor variations including the line edge roughness
会议论文
Hong Kong, Hong kong, August 3, 2016 - August 5, 2016
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:23/0
  |  
提交时间:2020/11/15
Etching
Semiconductor doping
Transistors
Charge plasmas
Electrical characteristic
Etching process
Junctionless
Junctionless transistors
Line Edge Roughness
ON/OFF current ratio
variation
Temperature distribution for laser etching of metal thin films on polyimide substrate
期刊论文
Zhongguo Jiguang/Chinese Journal of Lasers, 2016, 卷号: 43, 期号: 5
作者:
Zhang, Hongwei
;
Ren, Ni
;
Xue, Hongtao
;
Tang, Fuling
;
Yan, Xiaodong
收藏
  |  
浏览/下载:0/0
  |  
提交时间:2020/11/14
Ablation
Composite films
Copper
Etching
Irradiation
Laser beam effects
Metallic films
Polyimides
Temperature distribution
Thin films
Ablation depth
Laser etching
Laser technique
Metal thin film
Pulse laser
The Immunity of Doping-less Junctionless Transistor Variations Including the Line Edge Roughness
会议论文
作者:
Wan, Wenbo
;
Lou, Haijun
;
Xiao, Ying
;
Lin, Xinnan
收藏
  |  
浏览/下载:13/0
  |  
提交时间:2019/11/15
charge-plasma
Junctionless
LER
variation
Tailored ultralow dielectric permittivity in high-performance fluorinated polyimide films by adjusting nanoporous characterisitics
期刊论文
Journal of Physical Chemistry C, 2012, 卷号: 116, 期号: 44, 页码: 23676-23681
作者:
Zha, Jun-Wei
;
Jia, Hong-Juan
;
Wang, Hai-Yan
;
Dang, Zhi-Min
收藏
  |  
浏览/下载:0/0
  |  
提交时间:2020/11/14
Dielectric materials
Etching
Low-k dielectric
Microelectronics
Nanoparticles
Nanostructured materials
Permittivity
Polyimides
Silica
Silica nanoparticles
SiO2 nanoparticles
Synthesis (chemical)
Thermodynamic stability
Alternative dielectrics
Fluorinated polyimides
In-situ polymerization process
Low dielectric
Microelectronic technologies
Nano-hybrid film
Relative dielectric permittivity
Ultra-low dielectric
Tailored Ultralow Dielectric Permittivity in High-Performance Fluorinated Polyimide Films by Adjusting Nanoporous Characterisitics
期刊论文
JOURNAL OF PHYSICAL CHEMISTRY C, 2012, 卷号: 116, 期号: 44, 页码: 23676-23681
作者:
Zha, Jun-Wei
;
Jia, Hong-Juan
;
Wang, Hai-Yan
;
Dang, Zhi-Min
收藏
  |  
浏览/下载:1/0
  |  
提交时间:2019/11/15
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