×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
上海大学 [20]
内容类型
会议论文 [20]
发表日期
2019 [1]
2018 [2]
2017 [2]
2016 [2]
2015 [1]
2014 [4]
更多...
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共20条,第1-10条
帮助
限定条件
内容类型:会议论文
专题:上海大学
第一署名单位
第一作者单位
通讯作者单位
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
The influence of surface processing on properties of CdZnTe films prepared by close-spaced sublimation
会议论文
SURFACE & COATINGS TECHNOLOGY, 2019-01-15
作者:
Yang, Fan[1]
;
Huang, Jian[2]
;
Zou, Tianyu[3]
;
Tang, Ke[4]
;
Zhang, Zilong[5]
收藏
  |  
浏览/下载:44/0
  |  
提交时间:2019/04/22
CdZnTe
Mechanical polishing
Film
Close-spaced sublimation
Research on polishing parameters analysis for wheel hub
会议论文
8th IEEE International Conference on Cybernetics and Intelligent Systems, CIS 2017 and IEEE Conference on Robotics, Automation and Mechatronics, RAM 2017, 2017-11-19
作者:
Chen, Hongqiang[1]
;
Chen, Chin-Yin[2]
;
Li, Guiqin[3]
;
Fang, Zaojun[4]
;
Li, Huaming[5]
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/04/22
Research on polishing parameters optimization for free curved surface
会议论文
13th IEEE Conference on Industrial Electronics and Applications, ICIEA 2018, 2018-05-31
作者:
Chen, Hongqiang[1]
;
Chen, Chin-Yin[2]
;
Li, Junjie[3]
;
Fang, Zaojun[4]
;
Li, Huamin[5]
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/04/22
Research on Polishing Parameters Analysis for Wheel Hub
会议论文
2017 IEEE INTERNATIONAL CONFERENCE ON CYBERNETICS AND INTELLIGENT SYSTEMS (CIS) AND IEEE CONFERENCE ON ROBOTICS, AUTOMATION AND MECHATRONICS (RAM), 2017-01-01
作者:
Chen, Hongqiang[1]
;
Chen, Chin-Yin[2]
;
Li, Guiqin[3]
;
Fang, Zaojun[4]
;
Li, Huaming[5]
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/04/24
polishing
process parameters
surface quality
robot system
material removal model
surface roughness model
Analysis and optimization of surface profile correcting mechanism of the pitch lap in large-aperture annular polishing
会议论文
OPTIFAB 2017, 2017-01-01
作者:
Zhang, Huifang[1]
;
Yang, Minghong[2]
;
Xu, Xueke[3]
;
Wu, Lunzhe[4]
;
Yang, Weiguang[5]
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/04/24
conventional annular polishing
pitch lap
conditioning mechanism
the profile measurement of large lap
deterministic full-aperture polishing
pressure distribution
REPARATION OF MG-DOPED COLLOIDAL SILICA ABRASIVE AND ITS CHEMICAL MECHANICAL POLISHING PERFORMANCES ON SILICON WAFER
会议论文
China Semiconductor Technology International Conference (CSTIC), 2016-01-01
作者:
Ma, Pan[1]
;
Lei, Hong[2]
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/04/26
Preparation of Mg-doped colloidal silica abrasive and its chemical mechanical polishing performances on silicon wafer
会议论文
China Semiconductor Technology International Conference, CSTIC 2016, 2016-03-13
作者:
Ma, Pan[1]
;
Lei, Hong[2]
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/04/26
The simulation of workpieces' surface in polishing
会议论文
OPTIFAB 2015, 2015-01-01
作者:
Wu, Lunzhe[1]
;
Xu, Xueke[2]
;
Yang, Minghong[3]
;
Wei, Chaoyang[4]
;
Liu, Shijie[5]
收藏
  |  
浏览/下载:10/0
  |  
提交时间:2019/04/26
The simulation of surface
the Preston formula
Boltzmann superposition principle
Winkler's hypothesis
Effect of Mn (II) ion on abrasive-free polishing of hard disk substrate
会议论文
4th International Conference on Frontiers of Manufacturing Science and Measuring Technology, ICFMM 2014, 2014-06-19
作者:
Fang, Liang[1]
;
Lei, Hong[2]
;
Zhao, Rong[3]
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/04/30
Effect of Benzoyl Peroxide/N, N-Dimethyl aniline initiating system on material removal rate in abrasive-free polishing of hard disk substrate
会议论文
International Conference on Planarization CMP Technology (ICPT)
作者:
Jiang, Ting[1]
;
Lei, Hong[2]
收藏
  |  
浏览/下载:5/0
  |  
提交时间:2019/04/30
©版权所有 ©2017 CSpace - Powered by
CSpace