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Effect of the technology of implanting nitrogen into buried oxide on the radiation hardness of the top gate oxide for partially depleted SOIPMOSFET 期刊论文
chinese physics, 2005, 卷号: 14, 期号: 3, 页码: 565-570
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:25/0  |  提交时间:2010/03/17
Effects of techniques of implanting nitrogen into buried oxide on the characteristics of partially depleted SOIPMOSFET 期刊论文
chinese physics letters, 2005, 卷号: 22, 期号: 3, 页码: 654-656
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:109/0  |  提交时间:2010/03/17
Effects of the technology of implanting nitrogen into buried oxide layer on the characteristics of partially depleted SOI nMOSFET 期刊论文
acta physica sinica, 2005, 卷号: 54, 期号: 1, 页码: 348-353
Zheng ZS; Liu ZL; Zhang GQ; Li N; Fan K; Zhang EX; Yi WB; Chen M; Wang X
收藏  |  浏览/下载:34/0  |  提交时间:2010/03/17
SOI  
Radiation response of partially-depleted MOS transistors fabricated in the fluorinated SIMOX wafers 会议论文
7th international conference on solid-state and integrated circuits technology, beijing, peoples r china, oct 18-21, 2004
Li, N; Zhang, GQ; Liu, ZL; Fan, K; Zheng, ZS; Lin, Q; Zhang, ZX; Lin, CL
收藏  |  浏览/下载:127/22  |  提交时间:2010/03/29
Effect of the implantation of fluorine on the mobility of channel electron for partially depleted SOI nMOSFET 会议论文
7th international conference on solid-state and integrated circuits technology, beijing, peoples r china, oct 18-21, 2004
Zheng, ZS; Liu, ZL; Zhang, GQ; Li, N; Fan, K
收藏  |  浏览/下载:168/30  |  提交时间:2010/03/29


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