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Influence of pH and abrasive concentration on polishing rate of amorphous Ge2Sb2Te5 film in chemical mechanical polishing 期刊论文
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 卷号: 29, 期号: 1, 页码: 11020
Zhang,ZF; Liu,WL; Song,ZT
收藏  |  浏览/下载:18/0  |  提交时间:2012/04/10
Effect of hydrogen peroxide concentration on surface micro- roughness of silicon wafer after final polishing 期刊论文
MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 6, 页码: 1010-1015
Wang,HB; Song,ZT; Liu,WL; Kong,H
收藏  |  浏览/下载:21/0  |  提交时间:2012/04/10
Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing 期刊论文
MICROELECTRONIC ENGINEERING, 2011, 卷号: 88, 期号: 9, 页码: 3020-3023
Zhang,ZF; Yan,WX; Zhang,L; Liu,WL; Song,ZT
收藏  |  浏览/下载:13/0  |  提交时间:2012/04/10


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