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Nanoscale patterns made by using a 13.5-nm Schwarzschild objective and a laser produced plasma source (EI CONFERENCE) 会议论文
Optical Micro- and Nanometrology IV, April 16, 2012 - April 18, 2012, Brussels, Belgium
Wang Z.; Wang X.; Mu B.; Bai Y.
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Lithium fluoride (LiF) crystal is a very promising candidate as nanometer resolution EUV and soft X-ray detector. Compared with other EUV and soft X-ray detectors  charge coupled device and photographic films  LiF crystal has high resolution  large field of view and wide dynamic range. In this paper  using LiF crystal as EUV detector and a Schwarzschild objective (SO) working at 13.5nm as projection optics  mesh images with 4.2 m  1.2 m and 800 nm line width and pinhole patterns with 1.5m diameter are acquired in projection imaging mode and direct writing mode  respectively. Fluorescence intensity profiles of images show that the resolution of mesh image is 900 nm  and the one of pinhole image is 800 nm. In the experiments  a spherical condense mirror based on normal incidence type is used to eliminate the damage and contamination on the masks (mesh and pinhole) caused by the laser plasma  and the energy density is not decreased compared with that the masks are close to the plasma. The development of the SO  the alignment of the objective and the imaging experiments are also reported. 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).  


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