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长春光学精密机械与物... [1]
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会议论文 [1]
发表日期
2012 [1]
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Nanoscale patterns made by using a 13.5-nm Schwarzschild objective and a laser produced plasma source (EI CONFERENCE)
会议论文
Optical Micro- and Nanometrology IV, April 16, 2012 - April 18, 2012, Brussels, Belgium
Wang Z.
;
Wang X.
;
Mu B.
;
Bai Y.
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提交时间:2013/03/25
Lithium fluoride (LiF) crystal is a very promising candidate as nanometer resolution EUV and soft X-ray detector. Compared with other EUV and soft X-ray detectors
charge coupled device and photographic films
LiF crystal has high resolution
large field of view and wide dynamic range. In this paper
using LiF crystal as EUV detector and a Schwarzschild objective (SO) working at 13.5nm as projection optics
mesh images with 4.2 m
1.2 m and 800 nm line width and pinhole patterns with 1.5m diameter are acquired in projection imaging mode and direct writing mode
respectively. Fluorescence intensity profiles of images show that the resolution of mesh image is 900 nm
and the one of pinhole image is 800 nm. In the experiments
a spherical condense mirror based on normal incidence type is used to eliminate the damage and contamination on the masks (mesh and pinhole) caused by the laser plasma
and the energy density is not decreased compared with that the masks are close to the plasma. The development of the SO
the alignment of the objective and the imaging experiments are also reported. 2012 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).
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