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CORC

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Theoretical Model of Thermal Stress in the Film-Substrate System of Optical Thin Film 期刊论文
JOURNAL OF ELECTRONIC MATERIALS, 2022, 卷号: 51, 期号: S10, 页码: 5937-5945
作者:  Shi, Yunyun;  Xu, Junqi;  Li, Yang;  Liu, Zheng;  Zhang, Kaifeng
收藏  |  浏览/下载：42/0  |  提交时间：2022/09/28
Research on the properties of HfO2optical films prepared with APS assisted electron beam evaporation deposition 会议论文
Hangzhou, China, 2021-05-23
作者:  Pan, Yong-Gang;  Liu, Zheng;  Li, Mian;  Liu, Wen-Cheng;  Bai, Long
收藏  |  浏览/下载：45/0  |  提交时间：2021/09/14
Influence of dry etching on the properties of SiO2 and HfO2 single layers 期刊论文
APPLIED OPTICS, 2020, 卷号: 59, 期号: 5, 页码: A128-A134
作者:  Xie, LY;  Liu, HS;  Zhao, J;  Jiao, HF;  Zhang, JL
收藏  |  浏览/下载：4/0  |  提交时间：2021/09/06
Charge trapping effect in HfO2-based high-k gate dielectric stacks after heavy ion irradiation: The role of oxygen vacancy 期刊论文
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2019, 卷号: 459, 页码: 143-147
作者:  Li, Zongzhen;  Liu, Tianqi;  Bi, Jinshun;  Yao, Huijun;  Zhang, Zhenxing
收藏  |  浏览/下载：34/0  |  提交时间：2022/01/19
Latent Reliability Degradation of Ultrathin Amorphous HfO2 Dielectric After Heavy Ion Irradiation: The Impact of Nano-Crystallization 期刊论文
IEEE ELECTRON DEVICE LETTERS, 2019, 卷号: 40, 期号: 10, 页码: 1634-1637
作者:  Li, Zongzhen;  Liu, Jie;  Zhai, Pengfei;  Liu, Tianqi;  Bi, Jinshun
收藏  |  浏览/下载：10/0  |  提交时间：2022/01/19
The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films 期刊论文
COATINGS, 2019, 卷号: 9, 期号: 5
作者:  Kong, Mingdong;  Li, Bincheng;  Guo, Chun;  Zeng, Peng;  Wei, Ming
收藏  |  浏览/下载：9/0  |  提交时间：2021/05/06
Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 778, 期号: 无, 页码: 579-587
作者:  Wang, Die;  He, Gang;  Liang, Shuang;  Liu, Mao
收藏  |  浏览/下载：56/0  |  提交时间：2020/03/31
Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by beta-ray 期刊论文
CHINESE PHYSICS B, 2019, 卷号: 28, 页码: 024215
作者:  Fang, Mei-Hua;  Tian, Peng-Yu;  Zhu, Mao-Dong;  Qi, Hong-Ji;  Fei, Tao
收藏  |  浏览/下载：44/0  |  提交时间：2019/04/02
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD-Derived Al2O3 Passivation Layer and Forming Gas Annealing 期刊论文
ADVANCED ELECTRONIC MATERIALS, 2018, 卷号: 4, 期号: 4, 页码: 9
作者:  Jiang, Shanshan;  He, Gang;  Liu, Mao;  Zhu, Li;  Liang, Shuang
收藏  |  浏览/下载：65/0  |  提交时间：2019/06/10
Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction 期刊论文
ACTA MATERIALIA, 2018, 卷号: 154, 页码: 190, 198
作者:  Liu, Xiaohua;  Zhou, Dayu;  Guan, Yan;  Li, Shuaidong;  Cao, Fei
收藏  |  浏览/下载：27/0  |  提交时间：2018/12/28

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