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ENHANCEMENT EFFECT OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED SIN CAPPING LAYER ON DIELECTRIC CAP QUANTUM-WELL DISORDERING 期刊论文
japanese journal of applied physics part 2-letters, 1995, 卷号: 34, 期号: 4a, 页码: l418-l421
CHOI WJ; LEE S; ZHANG JM; KIM Y; KIM SK; LEE JI; KANG KN; CHO K
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