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The influence of the InGaN back-barrier on the properties of Al(0.3)Ga(0.7)N/AlN/GaN/InGaN/GaN structure 期刊论文
european physical journal-applied physics, 2011, 卷号: 55, 期号: 1, 页码: 10102
Bi Y; Wang XL; Xiao HL; Wang CM; Peng EC; Lin DF; Feng C; Jiang LJ
收藏  |  浏览/下载:36/0  |  提交时间:2012/01/06
The transport mechanism of gate leakage current in AlGaN/GaN high electron mobility transistors 期刊论文
european physical journal-applied physics, 2011, 卷号: 55, 期号: 3, 页码: 30104
作者:  Deng QW;  Hou QF;  Bi Y
收藏  |  浏览/下载:15/0  |  提交时间:2011/09/14
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The influence of the 1st AlN and the 2nd GaN layers on properties of AlGaN/2nd AlN/2nd GaN/1st AlN/1st GaN structure 期刊论文
applied physics a-materials science & processing, 2011, 卷号: 104, 期号: 4, 页码: 1211-1216
作者:  Bi Y;  Lin DF;  Peng EC
收藏  |  浏览/下载:19/0  |  提交时间:2011/09/14
Low temperature characteristics of AlGaN/GaN high electron mobility transistors 期刊论文
european physical journal-applied physics, 2011, 卷号: 56, 期号: 1, 页码: 10101
Lin DF (Lin D. F.); Wang XL (Wang X. L.); Xiao HL (Xiao H. L.); Wang CM (Wang C. M.); Qiang LJ (Qiang L. J.); Feng C (Feng C.); Chen H (Chen H.); Hou QF (Hou Q. F.); Deng QW (Deng Q. W.); Bi Y (Bi Y.); Kang H (Kang H.)
收藏  |  浏览/下载:24/0  |  提交时间:2012/02/21
Comment on "radiative and nonradiative recombination process in inn films grown by metal organic chemical vapor deposition" [appl. phys. lett. 86, 142104 (2005)] 期刊论文
Applied physics letters, 2005, 卷号: 87, 期号: 17, 页码: 2
作者:  Liu, B;  Zhang, R;  Xie, ZL;  Xiu, XQ;  Bi, ZX
收藏  |  浏览/下载:12/0  |  提交时间:2019/05/12
Comment on 期刊论文
applied physics letters, 2005, 卷号: 87, 期号: 17, 页码: art.no.176101
Liu B; Zhang R; Xie ZL; Xiu XQ; Bi ZX; Gu SL; Shi Y; Zheng YD; Hu LJ; Chen YH; Wang ZG
收藏  |  浏览/下载:125/32  |  提交时间:2010/03/17


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