×
验证码:
换一张
忘记密码?
记住我
CORC
首页
科研机构
检索
知识图谱
申请加入
托管服务
登录
注册
在结果中检索
科研机构
大连理工大学 [28]
内容类型
期刊论文 [23]
专利 [5]
发表日期
2019 [4]
2018 [8]
2017 [1]
2016 [2]
2015 [2]
2014 [1]
更多...
×
知识图谱
CORC
开始提交
已提交作品
待认领作品
已认领作品
未提交全文
收藏管理
QQ客服
官方微博
反馈留言
浏览/检索结果:
共28条,第1-10条
帮助
限定条件
专题:大连理工大学
第一署名单位
第一作者单位
通讯作者单位
已选(
0
)
清除
条数/页:
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
排序方式:
请选择
作者升序
作者降序
题名升序
题名降序
发表日期升序
发表日期降序
提交时间升序
提交时间降序
Experimental evidence of ferroelectricity in calcium doped hafnium oxide thin films
期刊论文
Journal of Applied Physics, 2019, 卷号: 126
作者:
Yao, Yifan
;
Zhou, Dayu
;
Li, Shuaidong
;
Wang, Jingjing
;
Sun, Nana
收藏
  |  
浏览/下载:15/0
  |  
提交时间:2019/12/02
Sub-nanosecond pulse programming and device design strategy for analog resistive switching in HfOx-based resistive random access memory
期刊论文
APPLIED PHYSICS LETTERS, 2019, 卷号: 114
作者:
Hang, Cheng-Zhou
;
Wang, Chen
;
Gao, Bin
;
Chen, Huan
;
Xu, Ming-Hong
收藏
  |  
浏览/下载:16/0
  |  
提交时间:2019/12/02
Electric breakdown
Energy utilization
Hafnium compounds
Integrated circuit design
Intelligent systems
Monte Carlo methods
RRAM, Kinetic monte carlo simulation
Microscopic distribution
Neuromorphic computing
Resistive random access memory
Resistive random access memory (rram)
Resistive switching
Sub-nanosecond pulse
Thermal conductance, Switching
Effect of Sc and Y addition on the microstructure and properties of HCP-structured high-entropy alloys
期刊论文
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2019, 卷号: 125
作者:
Huang, Tiandang
;
Jiang, Hui
;
Lu, Yiping
;
Wang, Tongmin
;
Li, Tingju
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2019/12/02
Entropy
High-entropy alloys
Lamellar structures
Mechanical properties
Refractory alloys
Scandium
Ternary alloys
Titanium alloys
Zirconium alloys, Hexagonal close packed
Lattice distortions
Microstructure and properties
Needle-like
Paramagnetic behavior
Strength and ductilities
Y addition
Y element, Hafnium alloys
Effects of deposition temperature on the properties of sputtered yttrium-doped hafnium oxide thin films
期刊论文
MATERIALS RESEARCH EXPRESS, 2019, 卷号: 6
作者:
Zhao, Peng
;
Zhou, Dayu
;
Liu, Feng
;
Sun, Nana
;
Li, Shuaidong
收藏
  |  
浏览/下载:8/0
  |  
提交时间:2019/12/02
yttrium-doped hafnium oxide
temperature
composition
phase structure
surface morphology
electrical properties
Effects of Hf buffer layer at the Y-doped HfO2/Si interface on ferroelectric characteristics of Y-doped HfO(2 )films formed by reactive sputtering
期刊论文
CERAMICS INTERNATIONAL, 2018, 卷号: 44, 页码: 12841-12846
作者:
Zhang, Yu
;
Xu, Jun
;
Zhou, Da-Yu
;
Wang, Hang-Hang
;
Lu, Wen-Qi
收藏
  |  
浏览/下载:4/0
  |  
提交时间:2019/12/02
Hafnium oxide
Ferroelectricity
Buffer layer
TEM
Endurance properties of silicon-doped hafnium oxide ferroelectric and antiferroelectric-like thin films: A comparative study and prediction
期刊论文
ACTA MATERIALIA, 2018, 卷号: 154, 页码: 190-198
作者:
Liu, Xiaohua
;
Zhou, Dayu
;
Guan, Yan
;
Li, Shuaidong
;
Cao, Fei
收藏
  |  
浏览/下载:7/0
  |  
提交时间:2019/12/02
Hafnium oxide
Ferroelectric
Antiferroelectric
Endurance
Phase transition
Ferroelectric yttrium doped hafnium oxide films from all-inorganic aqueous precursor solution
期刊论文
CERAMICS INTERNATIONAL, 2018, 卷号: 44, 页码: 13867-13872
作者:
Wang, Xuexia
;
Zhou, Dayu
;
Li, Shuaidong
;
Liu, Xiaohua
;
Zhao, Peng
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2019/12/02
Films
X-ray methods
Ferroelectric properties
Capacitors
Titanium-vanadium-based alloy used for manufacturing additive, comprises preset amount of titanium, zirconium and/or hafnium, vanadium, niobium, tantalum, aluminum and molybdenum, and other elements.
专利
申请日期: 2018-01-01, 公开日期: 2018-02-27
作者:
LIU T DONG C MIN X WANG C
收藏
  |  
浏览/下载:6/0
  |  
提交时间:2019/12/02
Zirconium-niobium based alloy used for additive manufacturing technology comprises zirconium, zirconium molybdenum and tin, and zirconium, titanium, hafnium, niobium and tantalum based on certain atomic ratio.
专利
申请日期: 2018-01-01, 公开日期: 2018-04-10
作者:
LIU T DONG C MIN X WANG C
收藏
  |  
浏览/下载:2/0
  |  
提交时间:2019/12/02
Gamma phase strengthening alloy comprises aluminum, solid solution strengthening element containing iron and/or nickel, precipitation strengthening element containing niobium and/or hafnium, and boron and/or carbon.
专利
申请日期: 2018-01-01, 公开日期: 2018-03-23
作者:
MA Q DONG H ZHANG Y WANG Q DONG C
收藏
  |  
浏览/下载:9/0
  |  
提交时间:2019/12/02
©版权所有 ©2017 CSpace - Powered by
CSpace