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长春光学精密机械与物... [1]
大连化学物理研究所 [1]
山东大学 [1]
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Raman Spectroscopic Study on Silicon Films Prepared by Catalytic Chemical Vapor Deposition
会议论文
第十三届亚洲化学会, china, 2009-9-13
程士敏
;
任通
;
冯兆池
;
应品良
;
李灿
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  |  
浏览/下载:14/0
  |  
提交时间:2011/07/11
Effects of high magnetic field on the properties of hot-filament CVD diamond films
会议论文
6th International Conference on Thin Film Physics and Applications, TFPA 2007, 2007-09-25
作者:
Huang, Jian[1]
;
Peng, Hongyan[2]
;
Xu, Run[3]
;
Xu, Jinyong[4]
;
Liu, Jianmin[5]
收藏
  |  
浏览/下载:3/0
  |  
提交时间:2019/05/06
HFCVD
NCD
mean surface roughness
superconductor magnet
magnetic field
Low threshold field electron emission of diamond films (EI CONFERENCE)
会议论文
ICO20: Display Devices and Systems, August 21, 2005 - August 26, 2005, Changchun, China
Liu L.
;
Xia Y.
;
Chen S.
;
Lei D.
;
Zhao H.
;
Liang J.
;
Li M.
;
Wang W.
;
Gu C.
;
Ji H.
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  |  
浏览/下载:18/0
  |  
提交时间:2013/03/25
Since CVD diamond film possesses desirable properties
it has been widely investigated
and much research has been made in this field. In this experiment
we mainly studied the characteristics of field emission from the CVD diamond films. The motivation for the experiment is to gain some insight into a possible emission mechanism. The diamond films are grown using a hot filament chemical vapor deposition
basing on the diamond micro-grits on silicon substrates. And the diamond micro-grits are deposited on silicon substrates using electrophoresis coat method
through a solution of diamond micro-grits in ethyl alcohol. This study has revealed that emission can be obtained at fields as low as 1.8V/m. And the field emission measurements were carried out at a pressure of 10-4Pa.
Growth of nanocrystalline diamond films on co-cemented tungsten carbide substrates by hot filament CVD
会议论文
11th International Manufacturing Conference - Advances in Materials Manufacturing Science and Technology., September 18, 2004 - September 20, 2004
作者:
Sun, F.H.
;
Zhang, Z.M.
;
Shen, H.S.
;
Chen, M.
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  |  
浏览/下载:3/0
  |  
提交时间:2019/12/31
Influence of heated catalyzer on thermal distribution of substrate in HWCVD system
会议论文
2nd international conference on cat-cvd (hot-wire cvd) process, denver, colorado, sep 10-13, 2002
Zhang Q
;
Zhu M
;
Wang L
;
Liu E
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浏览/下载:11/0
  |  
提交时间:2010/11/15
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