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浏览/检索结果: 共3条，第1-3条 帮助 限定条件 内容类型：会议论文    专题：长春光学精密机械与物理研究所    第一署名单位    第一作者单位    通讯作者单位     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Roughness analysis of optical surfaces by X-ray scattering (EI CONFERENCE) 会议论文 2011 International Conference on Electronics and Optoelectronics, ICEOE 2011, July 29, 2011 - July 31, 2011, Dalian, China Meng Y.; Chen B.; Chen C. 收藏  |  浏览/下载：17/0  |  提交时间：2013/03/25 A grazing incidence x-ray scattering (XRS) method  Order perturbation theory (FOPT)  is stated briefly and an experimental facility based on an improved X-ray diffraction has been introduced  which can work with high performance. The x-ray scattering distributions of two super smooth silicon samples measured at the incidence angle 0.2 degree  as the x-ray wavelength is 0.154 nm  have been given and analyzed by the FOPT to give information about the surface profiles. As a comparison  the root mean square (RMS) surface roughness  grey-scale maps and one-dimensional power spectral density (1D PSD) have been derived from the atomic-force microscope (AFM) data. The results evaluated by FOPT are in good agreement with that of AFM  which indicates that x-ray scattering method is a practical characterization for the investigation of super smooth surfaces. 2011 IEEE.   Automatic spin coater for concave spherical substrate (EI CONFERENCE) 会议论文 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, July 8, 2007 - July 12, 2007, Chengdu, China Fengchao L.; Jingsong G.; Xiaoguo F.; Jingli Z.; Zhijun X.; Jun H.; Fenglin X.; Huiqing W.; Xiaohan L. 收藏  |  浏览/下载：19/0  |  提交时间：2013/03/25 Coating photoresist film with uniform thickness on concave spherical substrate (CSS) is very important for microfabrication of concave spherical optical elements by lithography technique via a laser direct writer  for the uneven photoresist film will result in ununiformity of line width so as to influence the characters of optical elements. For improving the uniformity of photoresist film coating on CSS  an automatic spin coater was designed. The process and the mathematical model of spin coating for CSS were analyzed. Difficulties for realizing the spin coater consist of the control of multi-axis motion precisely and collaboratively  valves on/ff properly and real-timely. A flexible and well-behaved spinning motion system was achieved by tmeans of principal and subordinate CPUs control. The motion program for spin coating could be created and implemented automatically while the pressure and the valves were was watched and controlled in real time. Film coating and laser direct writing experiments on a CSS with aperture equals to 100 mm and radius equals to 370 mm were performed. Photoresist film with uniform thickness on CSS was obtained by selecting proper spin coating parameters such as rotational speed  acceleration and viscosity of the photoresist. After development  the section analysis by the atomic force microscope showed that photoresist film thickness was about 517 nm in the center and about 520 nm in the edge of substrate  the film thickness error was within 1%  and the line width was about 6.0 m with steep sides parallel each other. Experimental results indicate that uniform thickness of thin photoresist film has been coated on CSS by the spin coater  which contributes to quality improvement of laser direct writing lines on CSS.   Key techniques of laser direct writing of fine lines on the spherical surface (EI CONFERENCE) 会议论文 ICO20: Optical Design and Fabrication, August 21, 2005 - August 26, 2005, Changchun, China Liang F.; Hu J. 收藏  |  浏览/下载：16/0  |  提交时间：2013/03/25 The main principles of laser direct writing (LDW) system for lines on the spherical surface (SS) are discussed. It is pointed out that line profile is determined by the exposure dose distribution  which lies on the light intensity distribution of focus plane and the scanning speed. To improve the quality of line profile on the SS  several key techniques as follows are introduced. Firstly  the unique system configuration  four axes mutually intersecting at the center of the SS  is adopted  which ensures the shape of the focus be maintained circular during the writing period. Secondly  an automatic focus system (AFS) with the function of automatic focus in a certain range is introduced. Thirdly  to guarantee the linear velocity to accord with the exposure character of the photoresist all the time  an efficient arithmetic that controls motors run at appropriate angular velocity in different latitude is developed. Finally  to achieve a stable and well-behaved system so as to compensate the velocity instability resulting from unavoidable errors of mechanical and electronics factor  a powerful programmable multi-axis controller (PMAC) is utilized as the kernel element of the servocontrol system  and the curves of step response and parabolic response achieved by feedforward and PID loop tuning indicate that the location precision and velocity stability have reached a high level. The experimental results of LDW of lines on the SS work piece with a diameter 30 mm and a radius equal to 100 mm are given. The section analysis of the lines on the photoresist by the atomic force microscope (AFM) after exposure and development is performed. The results show that line width is about 3.0 m  and the steep sides of the lines are parallel to each other.