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Microfabrication techniques and devices for thermal management of electronic devices 专利
专利号: US20190244832A1, 申请日期: 2019-08-08, 公开日期: 2019-08-08
作者:  GHONEIM, MOHAMED TAREK;  HUSSAIN, MUHAMMAD MUSTAFA
收藏  |  浏览/下载:25/0  |  提交时间:2019/12/30
一种后栅工艺假栅的制造方法和后栅工艺假栅 专利
专利号: US9419095, 申请日期: 2016-08-16, 公开日期: 2014-06-12
作者:  李春龙;  李俊峰;  闫江;  赵超
收藏  |  浏览/下载:5/0  |  提交时间:2017/06/12
一种制备原位掺杂Pt的NiO有序纳米线阵列的方法 专利
专利号: US9418843, 申请日期: 2016-08-16, 公开日期: 2014-07-24
作者:  李冬梅;  陈鑫;  梁圣法;  牛洁斌;  张培文
收藏  |  浏览/下载:14/0  |  提交时间:2017/06/09
半导体结构及其制造方法 专利
专利号: US9397007, 申请日期: 2016-07-19, 公开日期: 2014-07-10
作者:  杨达;  钟汇才;  梁擎擎;  赵超
收藏  |  浏览/下载:11/0  |  提交时间:2017/06/12
半导体器件制造方法 专利
专利号: US9331172, 申请日期: 2016-03-03, 公开日期: 2014-03-20
作者:  李春龙;  李俊峰;  闫江;  孟令款;  贺晓彬
收藏  |  浏览/下载:16/0  |  提交时间:2017/06/12
Method for fabricating negative photoresist etched pits and trenches as controlled optical path and a device fabricated thereby 专利
专利号: WO2014150321A1, 申请日期: 2014-09-25, 公开日期: 2014-09-25
作者:  LEE, JONATHAN EDWARD;  TRYSON, MICHAEL
收藏  |  浏览/下载:14/0  |  提交时间:2019/12/31
Directional transporting of water droplets on aluminum alloy substrate, comprises pretreating aluminum substrate, etching, preheating, coating photoresist on surface, photolithographic processing, UV exposing, and removing photoresist. 专利
申请日期: 2014-01-01, 公开日期: 2014-08-06
作者:  XU W LIU X YANG X SUN J
收藏  |  浏览/下载:9/0  |  提交时间:2019/12/11
Method for performing plane carbon preparation of flat carbon film membrane electrode, involves performing uniformly spin coating of photoresist on conductive substrate, and under protection of inert gas with certain pressure. 专利
申请日期: 2013-01-01, 公开日期: 2013-05-01
作者:  SHI K ZHANG H WANG C ZHAN D ZHANG Y
收藏  |  浏览/下载:8/0  |  提交时间:2019/12/13
Low-cost micronano integrated structure manufacturing method, involves pressing micrometer quartz die with photoresist, developing to obtain micronano integrated structure, and packing integrated structure. 专利
申请日期: 2013-01-01, 公开日期: 2013-01-30
作者:  CHENG E YIN Z ZOU H
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/13
Microfabrication of SU-8 photoresist comprises grinding cleaned metal substrate and rotary coating SU-8 photoresist, exposing, baking, ultrasonically processing spin coating, developing SU-8 photoresist film, washing, and drying. 专利
申请日期: 2013-01-01, 公开日期: 2013-12-11
作者:  ZHAO M ZHAO S ZHANG X DU L WANG A
收藏  |  浏览/下载:3/0  |  提交时间:2019/12/13


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