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Chemical metallurgy purification of polysilicon involves utilizing scanning electronic microscope to observe silicon texture, and washing crushed silicon grain with sodium hydroxide solution, hydrochloric acid and nitric acid. 专利
申请日期: 2008-01-01, 公开日期: 2008-11-26
作者:  TAN Y JIANG D LI G XU F LIU Y HU Z
收藏  |  浏览/下载:2/0  |  提交时间:2019/12/27
Magnesium alloy surface treatment method, involves alkaline cleaning, acid cleaning and chemical oxidation, post-treatment and washing treatment in each procedure. 专利
申请日期: 2006-01-01, 公开日期: 2006-06-14
作者:  LIANG C ZHENG R WANG H
收藏  |  浏览/下载:6/0  |  提交时间:2020/01/02
Manufacture of semiconductor laser device 专利
专利号: JP1988072178A, 申请日期: 1988-04-01, 公开日期: 1988-04-01
作者:  YAMAMOTO ATSUYA;  SUGINO TAKASHI;  HIROSE MASANORI;  YOSHIKAWA AKIO
收藏  |  浏览/下载:12/0  |  提交时间:2020/01/13


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