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科研机构
半导体研究所 [33]
内容类型
期刊论文 [29]
会议论文 [4]
发表日期
2011 [1]
2010 [1]
2009 [2]
2008 [2]
2006 [2]
2004 [1]
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半导体材料 [33]
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Defect properties of as-grown and electron-irradiated Te-doped GaSb studied by positron annihilation
期刊论文
semiconductor science and technology, 2011, 卷号: 26, 期号: 7, 页码: article no.75016
Li H
;
Zhou K
;
Pang JB
;
Shao YD
;
Wang Z
;
Zhao YW
收藏
  |  
浏览/下载:52/10
  |  
提交时间:2011/07/05
UNDOPED GALLIUM ANTIMONIDE
SELF-DIFFUSION
NATIVE DEFECTS
N-TYPE
CRYSTALS
CATHODOLUMINESCENCE
PHOTOLUMINESCENCE
SEMICONDUCTORS
SPECTROSCOPY
LUMINESCENCE
Origin of flat-band voltage sharp roll-off in metal gate/high-k/ultrathin- SiO2/Si p-channel metal-oxide-semiconductor stacks
期刊论文
applied physics letters, 2010, 卷号: 97, 期号: 13, 页码: art. no. 132908
Zheng XH (Zheng X. H.)
;
Huang AP (Huang A. P.)
;
Xiao ZS (Xiao Z. S.)
;
Yang ZC (Yang Z. C.)
;
Wang M (Wang M.)
;
Zhang XW (Zhang X. W.)
;
Wang WW (Wang W. W.)
;
Chu PK (Chu Paul K.)
收藏
  |  
浏览/下载:10/0
  |  
提交时间:2010/11/14
OXYGEN
GATE
DIFFUSION
FILMS
Growth of (10(1)over-bar(3)over-bar) semipolar GaN on m-plane sapphire by hydride vapor phase epitaxy
期刊论文
journal of crystal growth, 2009, 卷号: 311, 期号: 17, 页码: 4153-4157
作者:
Wei TB
;
Wei XC
;
Duan RF
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  |  
浏览/下载:84/6
  |  
提交时间:2010/03/08
HRXRD
PL
Stacking fault
HVPE
GaN
Semipolar
Annealing study of carrier concentration in gradient-doped GaAs/GaAlAs epilayers grown by molecular beam epitaxy
期刊论文
applied optics, 2009, 卷号: 48, 期号: 9, 页码: 1715-1720
Zhang YJ
;
Chang BK
;
Yang Z
;
Niu J
;
Xiong YJ
;
Shi F
;
Guo H
;
Zeng YP
收藏
  |  
浏览/下载:65/25
  |  
提交时间:2010/03/08
GAAS PHOTOCATHODES
GALLIUM-ARSENIDE
ALXGA1-XAS
DIFFUSION
SURFACE
ENERGY
Effect of indium-doped interlayer on the strain relief in GaN films grown on Si(111)
期刊论文
physica status solidi a-applications and materials science, 2008, 卷号: 205, 期号: 2, 页码: 294-299
Wu, JJ
;
Zhao, LB
;
Zhang, GY
;
Liu, XL
;
Zhu, QS
;
Wang, ZG
;
Jia, QJ
;
Guo, LP
;
Hu, TD
收藏
  |  
浏览/下载:65/3
  |  
提交时间:2010/03/08
CHEMICAL-VAPOR-DEPOSITION
TEMPERATURE ALN INTERLAYERS
PHASE EPITAXY
OPTICAL-PROPERTIES
SURFACTANT
SUBSTRATE
STRESS
SI
REDUCTION
SAPPHIRE
Influence of different interlayers on growth mode and properties of InN by MOVPE
期刊论文
chinese physics letters, 2008, 卷号: 25, 期号: 1, 页码: 238-241
Zhang, RQ
;
Liu, XL
;
Kang, TT
;
Hu, WG
;
Yang, SY
;
Jiao, CM
;
Zhu, QS
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  |  
浏览/下载:51/3
  |  
提交时间:2010/03/08
DEFECT STRUCTURE
EPITAXIAL GAN
BAND-GAP
Crack control in GaN grown on silicon (111) using In doped low-temperature AlGaN interlayer by metalorganic chemical vapor deposition
期刊论文
optical materials, 2006, 卷号: 28, 期号: 10, 页码: 1227-1231
Wu JJ (Wu Jiejun)
;
Han XX (Han Xiuxun)
;
Li JM (Li Jiemin)
;
Wei HY (Wei Hongyuan)
;
Cong GW (Cong Guangwei)
;
Liu XL (Liu Xianglin)
;
Zhu QS (Zhu Qinsheng)
;
Wang ZG (Wang Zhanguo)
;
Jia QJ (Jia Quanjie)
;
Guo LP (Guo Liping)
;
Hu TD (Hu Tiandou)
;
Wang HH (Wang Huanhua)
收藏
  |  
浏览/下载:49/0
  |  
提交时间:2010/04/11
in doping
cracks
Si(111) substrate
LT-AlGaN interlayer
metalorganic chemical vapor deposition
GaN
PHASE EPITAXY
INDIUM-SURFACTANT
OPTICAL-PROPERTIES
SI(111)
STRESS
FILMS
Transport phenomena in radial flow MOCVD reactor with three concentric vertical inlets
期刊论文
journal of crystal growth, 2006, 卷号: 293, 期号: 2, 页码: 498-508
Zuo R (Zuo Ran)
;
Zhang H (Zhang Hong)
;
Liu XL (Liu Xiang-lin)
收藏
  |  
浏览/下载:58/0
  |  
提交时间:2010/04/11
flow recirculation
numerical modeling
reactor
transport process
MOCVD
thin film growth
CHEMICAL-VAPOR-DEPOSITION
PHASE EPITAXY
MOVPE REACTOR
GROWTH
DESIGN
GAN
Graded tensile-strained bulk InGaAs/InP superluminescent diode with very wide emission spectrum
期刊论文
chinese optics letters, 2004, 卷号: 2, 期号: 6, 页码: 359-361
作者:
Wang Wei
;
Wang Wei
收藏
  |  
浏览/下载:10/0
  |  
提交时间:2010/11/23
Effects and numerical analysis of argon gas flow on the oxygen concentration in Czochralski silicon single crystal growth
会议论文
iumrs/icem 2002 conference, xian, peoples r china, jun 10-14, 2002
Zhang ZC
;
Ren BY
;
Chen YH
;
Yang SY
;
Wang ZG
收藏
  |  
浏览/下载:25/0
  |  
提交时间:2010/11/15
Czochralski method
growth from melt
semiconductor silicon
argon gas flow
computer simulation
oxygen content
FURNACE PRESSURE
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