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浏览/检索结果: 共6条，第1-6条 帮助 限定条件 学科主题：半导体材料    内容类型：会议论文     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 The difference of Si doping efficiency in GaN and AlGaN in GaN-based HBT structure 会议论文 32nd international symposium on compound semiconductors, rust, germany, sep 18-22, 2005 Ran, JX; Wang, XL; Hu, GX; Li, JP; Wang, JX; Wang, CM; Zeng, YP; Li, JM 收藏  |  浏览/下载：167/71  |  提交时间：2010/03/29 ALN  IMPURITIES  DONOR   Homoepitaxial growth and characterization of 4H-SiC epilayers by low-pressure hot-wall chemical vapor deposition 会议论文 international conference on silicon carbide and related materials (icscrm 2005), pittsburgh, pa, sep 18-23, 2005 Sun, GS (Sun, Guosheng); Ning, J (Ning, Jin); Gong, QC (Gong, Quancheng); Gao, X (Gao, Xin); Wang, L (Wang, Lei); Liu, XF (Liu, Xingfang); Zeng, YP (Zeng, Yiping); Li, JM (Li, Jinmin) 收藏  |  浏览/下载：100/29  |  提交时间：2010/03/29 homoepitaxial growth  low-pressure hot-wall CVD  structural and optical characteristics  intentional doping  Schottky barrier diodes   Micro-fabricated Al0.3Ga0.7As pyramids for potential SPM applications 会议论文 13th international conference on semiconducting and insulating materials (simc xiii), beijing, peoples r china, sep 20-25, 2004 Sun, J; Hu, LZ; Sun, YC; Wang, ZY 收藏  |  浏览/下载：59/0  |  提交时间：2010/03/29 GROWTH   Hydrogen behavior in GaN epilayers grown by NH3-MBE 会议论文 11th international conference on molecular beam epitaxy (mbe-xi), beijing, peoples r china, sep 11-15, 2000 Kong MY; Zhang JP; Wang XL; Sun DZ 收藏  |  浏览/下载：12/0  |  提交时间：2010/11/15 impurities  molecular beam epitaxy  nitrides  semiconducting III-V materials  GALLIUM NITRIDE  SAPPHIRE SUBSTRATE  DEFECTS  HETEROSTRUCTURE  SEMICONDUCTORS  STRESS   Observation of deep electron states in n-type Al-doped ZnS1-xTex grown by molecular beam epitaxy 会议论文 6th international conference on solid-state and integrated-circuit technology, shanghai, peoples r china, oct 22-25, 2001 Lu LW; Ge WK; Sou IK; Wang J 收藏  |  浏览/下载：15/0  |  提交时间：2010/10/29 ZNSTE   The influence of thickness on properties of GaN buffer layer and heavily Si-doped GaN grown by metalorganic vapor-phase epitaxy 会议论文 2nd international conference on nitride semiconductors (icns 97), tokushima city, japan, oct 27-31, 1997 Liu XL; Wang LS; Lu DC; Wang D; Wang XH; Lin LY 收藏  |  浏览/下载：4/0  |  提交时间：2010/11/15 MOVPE  GaN  GaN Buffer  heavy Si-doping