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Flattening of low temperature epitaxial ge1-xsnx/ge/si(100) alloys via mass transport during post-growth annealing 期刊论文
Applied surface science, 2011, 卷号: 257, 期号: 9, 页码: 4468-4471
作者:  Wang, Wei;  Su, Shaojian;  Zheng, Jun;  Zhang, Guangze;  Xue, Chunlai
收藏  |  浏览/下载:122/0  |  提交时间:2019/05/12
Epitaxial growth and thermal stability of ge(1-x)sn(x) alloys on ge-buffered si(001) substrates 期刊论文
Journal of crystal growth, 2011, 卷号: 317, 期号: 1, 页码: 43-46
作者:  Su, Shaojian;  Wang, Wei;  Cheng, Buwen;  Zhang, Guangze;  Hu, Weixuan
收藏  |  浏览/下载:106/0  |  提交时间:2019/05/12
Flattening of low temperature epitaxial Ge1-xSnx/Ge/Si(100) alloys via mass transport during post-growth annealing 期刊论文
applied surface science, 2011, 卷号: 257, 期号: 9, 页码: 4468-4471
Wang W; Su SJ; Zheng J; Zhang GZ; Xue CL; Zuo YH; Cheng BW; Wang QM
收藏  |  浏览/下载:98/7  |  提交时间:2011/07/05
Epitaxial growth and thermal stability of Ge1-xSnx alloys on Ge-buffered Si(001) substrates 期刊论文
journal of crystal growth, 2011, 卷号: 317, 期号: 1, 页码: 43-46
Su SJ; Wang W; Cheng BW; Zhang GZ; Hu WX; Xue CL; Zuo YH; Wang QM
收藏  |  浏览/下载:73/4  |  提交时间:2011/07/05


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