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浏览/检索结果: 共2条，第1-2条 帮助 限定条件 发表日期：2011    内容类型：会议论文    专题：长春光学精密机械与物理研究所    第一署名单位    第一作者单位    通讯作者单位     已选(0)清除 条数/页：5101520253035404550556065707580859095100   排序方式：请选择作者升序作者降序题名升序题名降序发表日期升序发表日期降序提交时间升序提交时间降序 Rotation and scaling invariant feature lines for image matching (EI CONFERENCE) 会议论文 2011 International Conference on Mechatronic Science, Electric Engineering and Computer, MEC 2011, August 19, 2011 - August 22, 2011, Jilin, China Zhang Y.; Wang Y.; Qu H. 收藏  |  浏览/下载：15/0  |  提交时间：2013/03/25 Image matching has been one of the most fundamental issues computer vision over the decades. In this paper we propose a novel method based on making use of feature lines in order to achieve more robust image matching. The feature lines have the properties of rotation and scaling invariance  coined RIFLT(Rotation invariant feature line transform). Experimental results demonstrate the effectiveness and efficiency of the proposed method. Compare with the famous powerful algorithm Scale Invariant Feature Transform(SIFT)  the proposed method is more insensitive to noise. And for certain sequence of images  which contain clear lines  the proposed method is more efficiency. Using the feature lines obtained by our method  it is possible to matching two scene images with different rotation angles  scale and light distort. 2011 IEEE.   Fabrication of high-efficiency ultraviolet blazed gratings by use of direct Ar2-CHF3 ion-beam etching through a rectangular photoresist mask (EI CONFERENCE) 会议论文 International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, May 24, 2011 - May 26, 2011, Beijing, China Tan X. 收藏  |  浏览/下载：20/0  |  提交时间：2013/03/25 In ultraviolet spectroscopy  groove irregularity and surface roughness of nanometer magnitude can cause a significant loss of diffraction efficiency. Therefore  there is a constant need to improve the diffraction efficiency. A blazed grating can concentrate most of the light intensity into a desired diffraction order  it is important to control the groove shape precisely  so it is the optimum choice among gratings of different kinds of profile. As the operating wavelength of most UV spectral applications is less than 200 nm  especially the blaze angle and the apical angle. We have presented a direct shaping method to fabricate EUV blazed gratings by using an ion-beam mixture of Ar+ and CHF2 +to etch K9 glass with a rectangular photoresist mask. With this method  the required blaze angle is small  we have succeeded in fabricating well-shaped UV blazed gratings with a 1200 line/mm groove density and 8.54 blaze angles and 1200 line/mm groove density and 11.68 blaze angles  and the metrical efficiency is about 81% and 78%. The good performance of the gratings was verified by diffraction efficiency measurements. When one uses the etching model  the conditions on the ion-beam grazing incident angle and the CHF3partial pressure should be noted. Besides  since the etched groove shape depends on the aspect ratio of the photoresist mask ridge  if we wish to fabricate larger gratings with this method  we must improve the uniformity of the photoresist mask before ion-beam etching. 2011 Copyright Society of Photo-Optical Instrumentation Engineers (SPIE).