Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 光电技术研究所被WoS收录文章

	Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography
	Jiang, Wenbo 1,2; Hu, Song 3; Xie, Changqing 4; Zhu, Xiaoli 4; Zhao, Lixin 3; Xie, Weicheng 1,2; Wang, Jun 1,2; Dong, Xiucheng 1,2
刊名	MICROELECTRONIC ENGINEERING
	2011-10-01
卷号	88 期号:10 页码:3178-3181
关键词	Submicron photon sieve E-beam lithography X-ray lithography Key technique Error analysis
英文摘要	In this paper, a new hybrid method to fabricate submicron photon sieve is proposed, where the E-beam lithography and the X-ray lithography are used. It is found that 2.81 mu m thickness of the polyimide film, 400 nm thickness of the ZEP-520 and 280 mu C/cm(2) exposure dose are good for E-beam lithography, while 500 nm thickness of the PMMA and 30 s developing time are good for X-ray lithography. We have successfully fabricated the photon sieve with these parameters (the diameter of photon sieve: 250 mu m, the focal length: 150 mu m, the diameter of the outmost pinhole: 420 nm). Some key techniques of this method are analyzed respectively, and the error analysis are done at the end of this paper. It provides a direction of nanoscale optical element fabrication with higher resolution and lower cost. (C) 2011 Elsevier B.V. All rights reserved.
WOS标题词	Science & Technology ; Technology ; Physical Sciences
类目[WOS]	Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]	Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]	MODEL
收录类别	SCI
语种	英语
WOS记录号	WOS:000297400900025
公开日期	2015-12-24
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/3457]
专题	光电技术研究所_光电技术研究所被WoS收录文章
作者单位	1.Xihua Univ, Sch Elect & Informat Engn, Chengdu 610039, Peoples R China 2.Xihua Univ, Key Lab Signal & Informat Proc Sichuan Prov, Chengdu 610039, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 4.Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
推荐引用方式 GB/T 7714	Jiang, Wenbo,Hu, Song,Xie, Changqing,et al. Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography[J]. MICROELECTRONIC ENGINEERING,2011,88(10):3178-3181.
APA	Jiang, Wenbo.,Hu, Song.,Xie, Changqing.,Zhu, Xiaoli.,Zhao, Lixin.,...&Dong, Xiucheng.(2011).Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography.MICROELECTRONIC ENGINEERING,88(10),3178-3181.
MLA	Jiang, Wenbo,et al."Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography".MICROELECTRONIC ENGINEERING 88.10(2011):3178-3181.