Limiting pump intensity for sulfur-doped gallium selenide crystals
Guo J. ; Li D. J. ; Xie J. J. ; Zhang L. M. ; Feng Z. S. ; Andreev Y. M. ; Kokh K. A. ; Lanskii G. V. ; Potekaev A. I. ; Shaiduko A. V. ; Svetlichnyi V. A.
刊名Laser Physics Letters
2014
卷号11期号:5页码:6
ISSN号ISBN/1612-2011
英文摘要High optical quality undoped and sulfur-doped gallium selenide crystals were grown from melts by the modified vertical Bridgman method. Detailed study of the damage produced under femtosecond pulse exposure has shown that evaluation of the damage threshold by visual control is unfounded. Black matter spots produced on crystal surfaces do not noticeably decrease either its transparency or its frequency conversion efficiency as opposed to real damage identified as caked well-cohesive gallium structures. For the first time it was demonstrated that optimally sulfur-doped gallium selenide crystal possesses the highest resistivity to optical emission ( about four times higher in comparison with undoped gallium selenide).
收录类别SCI
语种英语
内容类型期刊论文
源URL[http://ir.ciomp.ac.cn/handle/181722/44128]  
专题长春光学精密机械与物理研究所_中科院长春光机所知识产出
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GB/T 7714
Guo J.,Li D. J.,Xie J. J.,et al. Limiting pump intensity for sulfur-doped gallium selenide crystals[J]. Laser Physics Letters,2014,11(5):6.
APA Guo J..,Li D. J..,Xie J. J..,Zhang L. M..,Feng Z. S..,...&Svetlichnyi V. A..(2014).Limiting pump intensity for sulfur-doped gallium selenide crystals.Laser Physics Letters,11(5),6.
MLA Guo J.,et al."Limiting pump intensity for sulfur-doped gallium selenide crystals".Laser Physics Letters 11.5(2014):6.
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