Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所 > 中科院长春光机所知识产出

	Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection
	Wang J. ; Jin C. ; Wang L. ; Guo B. ; Yu B.
刊名	Guangxue Xuebao/Acta Optica Sinica
	2014
卷号	34 期号:8
ISSN号	ISBN/02532239
英文摘要	The thickness of multilayer coatings in extreme ultraviolet lithography (EUVL) projection system is about 300 nm which is much greater than the work wavelength of 13.5 nm. The most energy can not punch the substrate and optical path difference of dozens of wavelength is induced. Then the image degrades. A model named equivalent work surface (EWS) is built up for coating analysis based on the principle of energy conservation. From the point of erengy modulation, the EWS model transforms the complex physical optics into brief and intuitive geometrical optics, getting recognizable data for commercial softwares. Finally with the aid of EWS, a diffraction-limited virtually-coated system is confirmed, proving the significance of the EWS model. The model can be used for the direction of following alignment and multi-reflection system optimization and coating analysis.
收录类别	EI
语种	中文
公开日期	2015-05-27
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/44004]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Wang J.,Jin C.,Wang L.,et al. Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection[J]. Guangxue Xuebao/Acta Optica Sinica,2014,34(8).
APA	Wang J.,Jin C.,Wang L.,Guo B.,&Yu B..(2014).Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection.Guangxue Xuebao/Acta Optica Sinica,34(8).
MLA	Wang J.,et al."Foundation and application of model for multilayers analysis in extreme ultra-violet lithography projection".Guangxue Xuebao/Acta Optica Sinica 34.8(2014).