CORC  > 物理研究所  > 物理所公开发表论文  > 期刊论文
Influence of defects in SiC (0001) on epitaxial graphene
Guo, Y ; Guo, LW ; Lu, W ; Huang, J ; Jia, YP ; Sun, W ; Li, ZL ; Wang, YF
刊名CHINESE PHYSICS B
2014
卷号23期号:8
关键词graphene silicon carbide defect
ISSN号1674-1056
通讯作者Guo, LW (reprint author), Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, Res & Dev Ctr Funct Crystals, Beijing 100190, Peoples R China.
中文摘要Defects in silicon carbide (SiC) substrate are crucial to the properties of the epitaxial graphene (EG) grown on it. Here we report the effect of defects in SiC on the crystalline quality of EGs through comparative studies of the characteristics of the EGs grown on SiC (0001) substrates with different defect densities. It is found that EGs on high quality SiC possess regular steps on the surface of the SiC and there is no discernible D peak in its Raman spectrum. Conversely, the EG on the SiC with a high density of defects has a strong D peak, irregular stepped morphology and poor uniformity in graphene layer numbers. It is the defects in the SiC that are responsible for the irregular stepped morphology and lead to the small domain size in the EG.
资助信息National Key Basic Research Program of China [2011CB932700]; Knowledge Innovation Project of the Chinese Academy of Sciences [KJCX2-YW-W22]; National Natural Science Foundation of China [51272279, 51072223]
语种英语
公开日期2015-04-14
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/58984]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Guo, Y,Guo, LW,Lu, W,et al. Influence of defects in SiC (0001) on epitaxial graphene[J]. CHINESE PHYSICS B,2014,23(8).
APA Guo, Y.,Guo, LW.,Lu, W.,Huang, J.,Jia, YP.,...&Wang, YF.(2014).Influence of defects in SiC (0001) on epitaxial graphene.CHINESE PHYSICS B,23(8).
MLA Guo, Y,et al."Influence of defects in SiC (0001) on epitaxial graphene".CHINESE PHYSICS B 23.8(2014).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace