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Magneto-transport properties of oriented Mn2CoAl films sputtered on thermally oxidized Si substrates
Xu, GZ ; Du, Y ; Zhang, XM ; Zhang, HG ; Liu, EK ; Wang, WH ; Wu, GH
刊名APPLIED PHYSICS LETTERS
2014
卷号104期号:24
ISSN号0003-6951
通讯作者Wang, WH (reprint author), Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Inst Phys, State Key Lab Magnetism, Beijing 100190, Peoples R China.
中文摘要Spin gapless semiconductors are interesting family of materials by embracing both magnetism and semiconducting due to their unique band structure. Its potential application in future spintronics requires realization in thin film form. In this Letter, we report fabrication and transport properties of spin gapless Mn2CoAl films prepared on thermally oxidized Si substrates by magnetron sputtering deposition. The films deposited at 673K are well oriented to (001) direction and display a uniform-crystalline surface. Magnetotransport measurements on the oriented films reveal a semiconducting-like resistivity, small anomalous Hall conductivity, and linear magnetoresistance representative of the transport signatures of spin gapless semiconductors. The magnetic properties of the films have also been investigated and compared to that of bulk Mn2CoAl, showing small discrepancy induced by the composition deviation. (C) 2014 AIP Publishing LLC.
资助信息National Basic Research Program of China ("973" Programs) [2012CB619405]; National Natural Science Foundation of China [51171207, 11174352]
语种英语
公开日期2015-04-14
内容类型期刊论文
源URL[http://ir.iphy.ac.cn/handle/311004/58905]  
专题物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式
GB/T 7714
Xu, GZ,Du, Y,Zhang, XM,et al. Magneto-transport properties of oriented Mn2CoAl films sputtered on thermally oxidized Si substrates[J]. APPLIED PHYSICS LETTERS,2014,104(24).
APA Xu, GZ.,Du, Y.,Zhang, XM.,Zhang, HG.,Liu, EK.,...&Wu, GH.(2014).Magneto-transport properties of oriented Mn2CoAl films sputtered on thermally oxidized Si substrates.APPLIED PHYSICS LETTERS,104(24).
MLA Xu, GZ,et al."Magneto-transport properties of oriented Mn2CoAl films sputtered on thermally oxidized Si substrates".APPLIED PHYSICS LETTERS 104.24(2014).
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