Laser interference nanolithography with a 405nm fiber semiconductor laser

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所 > 中科院长春光机所知识产出 > 会议论文

	Laser interference nanolithography with a 405nm fiber semiconductor laser
	Xu J. ; Wang Z. ; Weng Z. ; Li Z. ; Sun X. ; Liu L. ; Zhao L. ; Yue Y. ; Zhang J.
	2013
会议名称	Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012
会议地点	Changchun, China
页码	262-267
英文摘要	This paper presents a method of laser interference nanolithography for the formation of interference patterns on the resist using a fiber semiconductor laser with a wavelength of 405nm. In the method, surface pattern structures are fabricated through the control of the incident angles of two interfering beams, the exposure dose of laser radiation and the development time. The angle adjustment becomes more convenient and the influence of environmental variations on the system has been reduced due to the use of fiber optic components. In the work, a feature size of down to 63nm and a pattern period of 215nm were achieved. The experimental results have shown that the method can be used for low cost micro and nano fabrication of periodical surface patterns with the features of low cost, simplicity and flexibility. (2013) Trans Tech Publications, Switzerland.
收录类别	EI
会议录	Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012
会议录出版者	Trans Tech Publications Ltd
会议录出版地	Changchun, China
内容类型	会议论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/41063]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出_会议论文
推荐引用方式 GB/T 7714	Xu J.,Wang Z.,Weng Z.,et al. Laser interference nanolithography with a 405nm fiber semiconductor laser[C]. 见:Asia Pacific Conference on Optics Manufacture 2012, APCOM 2012, August 26, 2012 - August 28, 2012. Changchun, China.