Fabrication of Nb/Al2O3/Nb Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition

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	Fabrication of Nb/Al2O3/Nb Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition
	Lu, RT ; Elliot, AJ ; Wille, L ; Mao, B ; Han, SY ; Wu, JZ ; Talvacchio, J ; Schulze, HM ; Lewis, RM ; Ewing, DJ ; Yu, HF ; Xue, GM ; Zhao, SP
刊名	IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
	2013
卷号	23 期号:3
关键词	Atomic layer deposition (ALD) Josephson junction
ISSN号	1051-8223
通讯作者	Lu, RT (reprint author), Univ Kansas, Dept Phys & Astron, Lawrence, KS 66045 USA.
中文摘要	Atomic layer deposition (ALD) provides a promising approach for deposition of ultrathin low-defect-density tunnel barriers, and it has been implemented in a high-vacuum magnetron sputtering system for in situ deposition of ALD-Al2O3 tunnel barriers in superconductor-insulator-superconductor Josephson junctions. A smooth ALD-Al2O3 barrier layer was grown on an Al-wetted Nb bottom electrode and was followed with a top Nb electrode growth using sputtering. Preliminary low temperature measurements of current-voltage characteristics of the Josephson junctions made from these trilayers confirmed the integrity of the ALD-Al2O3 barrier layer. However, the IcRN product of the junctions is much smaller than the value expected from the Ambegaokar-Baratoff formula suggesting a significant pair-breaking mechanism at the interfaces.
资助信息	ARO [W911NF-09-1-0295, W911NF-12-1-0412]; NSF [NSF-DMR-1105986, EPSCoR-0903806]; State of Kansas through Kansas Technology Enterprise Corporation; DMEA [H94003-04-D-0004-0149]; National Natural Science Foundation of China [11104340]; 973 Program [2009CB929102]
语种	英语
公开日期	2014-01-16
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/57002]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Lu, RT,Elliot, AJ,Wille, L,et al. Fabrication of Nb/Al2O3/Nb Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition[J]. IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,2013,23(3).
APA	Lu, RT.,Elliot, AJ.,Wille, L.,Mao, B.,Han, SY.,...&Zhao, SP.(2013).Fabrication of Nb/Al2O3/Nb Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition.IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,23(3).
MLA	Lu, RT,et al."Fabrication of Nb/Al2O3/Nb Josephson Junctions Using In Situ Magnetron Sputtering and Atomic Layer Deposition".IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY 23.3(2013).