Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias

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	Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias
	Zhang, GP ; Wang, XQ ; Lv, GH ; Pang, H ; Zhou, L ; Chen, W ; Huang, J ; Yang, S
刊名	PLASMA SCIENCE & TECHNOLOGY
	2013
卷号	15 期号:6 页码:542
关键词	cathodic vacuum arc Ti-Al-N film pulsed bias
ISSN号	1009-0630
通讯作者	Zhang, GP (reprint author), Chinese Acad Sci, Inst Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	Ti-Al-N hard films have been prepared by cathodic arc deposition by using an unipolar pulsed bias. In the present study, Ti-Al-N films were deposited on stainless steel and silicon wafers. The deposition rate, micrograph, preferred orientation and composition were systematically investigated by usingx-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), and a scanning electron microscope (SEM). It is shown that substate bias duty cycle and frequency have a great effect on film structure. A simple explanation for the results is also presented.
资助信息	National Natural Science Foundation of China [10735090]; National Magnetic Confinement Fusion Science Program [2009GB106004]; Scientific and Technological Project of Beijing
语种	英语
公开日期	2014-01-16
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/56871]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhang, GP,Wang, XQ,Lv, GH,et al. Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias[J]. PLASMA SCIENCE & TECHNOLOGY,2013,15(6):542.
APA	Zhang, GP.,Wang, XQ.,Lv, GH.,Pang, H.,Zhou, L.,...&Yang, S.(2013).Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias.PLASMA SCIENCE & TECHNOLOGY,15(6),542.
MLA	Zhang, GP,et al."Deposition of Ti-Al-N Films by Using a Cathodic Vacuum Arc with Pulsed Bias".PLASMA SCIENCE & TECHNOLOGY 15.6(2013):542.