Large enhancement of Kerr rotation in MnBixAl0.15 (0.4 <= x < 0.7) thin films

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	Large enhancement of Kerr rotation in MnBixAl0.15 (0.4 <= x < 0.7) thin films
	Zhu, T ; Wang, YJ
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	1999
卷号	32 期号:16 页码:1997
关键词	MAGNETOOPTICAL PROPERTIES ELECTRONIC-STRUCTURE ALLOY-FILMS MNBI
ISSN号	0022-3727
通讯作者	Zhu, T: Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, POB 603, Beijing 100080, Peoples R China.
中文摘要	MnBixAl0.15 (0.4 less than or equal to x less than or equal to 0.9) thin films with an Al protective layer have been prepared using e-beam evaporation. The Ken rotation as a function of the Bi concentration, x, has been investigated. Compared with MnBix thin films, it is found that a large enhancement of Ken rotation appears in the MnBixAl0.15 thin films with 0.4 less than or equal to x < 0.7, but no enhancement of Ken rotation appears when x is greater than 0.7. When x = 0.5, a maximum Ken rotation of 2.75 degrees is observed at 633 nm for the MnBi0.5Al0.15 thin film, which is much larger than that of 1.56 degrees for the MnBi0.5 thin film. The possible reason for the enhancement of Ken rotation is discussed.
收录类别	SCI
语种	英语
公开日期	2013-09-18
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/40588]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Zhu, T,Wang, YJ. Large enhancement of Kerr rotation in MnBixAl0.15 (0.4 <= x < 0.7) thin films[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,1999,32(16):1997.
APA	Zhu, T,&Wang, YJ.(1999).Large enhancement of Kerr rotation in MnBixAl0.15 (0.4 <= x < 0.7) thin films.JOURNAL OF PHYSICS D-APPLIED PHYSICS,32(16),1997.
MLA	Zhu, T,et al."Large enhancement of Kerr rotation in MnBixAl0.15 (0.4 <= x < 0.7) thin films".JOURNAL OF PHYSICS D-APPLIED PHYSICS 32.16(1999):1997.