Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off

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	Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off
	Xia, XX ; Yang, HF ; Sun, YM ; Wang, ZL ; Wang, L ; Cui, Z ; Gu, CZ
刊名	MICROELECTRONIC ENGINEERING
	2008
卷号	85 期号:5-6 页码:1433
ISSN号	0167-9317
通讯作者	Gu, CZ: Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, POB 603, Beijing 100080, Peoples R China.
中文摘要	A novel micro-fabrication process for terahertz (THz) metamaterials (MMs) has been developed using S1813/LOR bi-layer stack. Desirable undercut resist profiles were created to assist lift-off process and to reduce defect level, which are frequently encountered in conventional single layer photoresist process. A series of experiments has been carried out to investigate the process conditions in order to achieve controllable undercut profiles in S1813/LOR bi-layer stack using a standard alkaline developer CD26. With the new bi-layer resist process, a large area THz MMs with high quality was fabricated and characterized by a terahertz time domain spectroscopy (THz-TDS). (c) 2008 Elsevier B.V. All rights reserved.
收录类别	SCI
语种	英语
公开日期	2013-09-17
内容类型	期刊论文
源URL	[http://ir.iphy.ac.cn/handle/311004/37953]
专题	物理研究所_物理所公开发表论文_物理所公开发表论文_期刊论文
推荐引用方式 GB/T 7714	Xia, XX,Yang, HF,Sun, YM,et al. Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off[J]. MICROELECTRONIC ENGINEERING,2008,85(5-6):1433.
APA	Xia, XX.,Yang, HF.,Sun, YM.,Wang, ZL.,Wang, L.,...&Gu, CZ.(2008).Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off.MICROELECTRONIC ENGINEERING,85(5-6),1433.
MLA	Xia, XX,et al."Fabrication of terahertz metamaterials using S1813/LOR stack by lift-off".MICROELECTRONIC ENGINEERING 85.5-6(2008):1433.