GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER | |
C. J. Dong ; M. Xu ; W. Lu ; Q. Z. Huang | |
刊名 | Surface Review and Letters |
2013 | |
卷号 | 20期号:2 |
关键词 | Thin films nitrides sputtering microstructure chemical-vapor-deposition molecular-beam epitaxy optical-properties lattice-constants phase epitaxy wurtzite inn thin-films layers spectroscopy nitridation |
ISSN号 | 0218-625X |
原文出处 | |
语种 | 英语 |
公开日期 | 2013-12-24 |
内容类型 | 期刊论文 |
源URL | [http://ir.imr.ac.cn/handle/321006/71188] |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | C. J. Dong,M. Xu,W. Lu,et al. GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER[J]. Surface Review and Letters,2013,20(2). |
APA | C. J. Dong,M. Xu,W. Lu,&Q. Z. Huang.(2013).GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER.Surface Review and Letters,20(2). |
MLA | C. J. Dong,et al."GROWTH OF HIGHLY (0002) ORIENTED InN FILMS ON AlInN/AlN BILAYER".Surface Review and Letters 20.2(2013). |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论