Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering

CORC > 宁波材料技术与工程研究所 > 中国科学院宁波材料技术与工程研究所 > 宁波所知识产出

	Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering
	梁凌燕、曹鸿涛 ; Hao Luo, Ling Yan Liang,* Hong Tao Cao,* Zhi Min Liu, and Fei Zhuge
刊名	ACS Applied Materials &Interfaces
	2012-10-01
卷号	32 期号:4 页码:5673—5677
通讯作者	梁凌燕、曹鸿涛
合作状况	李雨桐
中文摘要	In this paper, SnOx films were produced by reactive radio frequency magnetron sputtering under various oxygen partial pressure (PO) in conjunction with a thermal annealing at 200 °C afterwards. The obtained SnOx films were systematically studied by means of various techniques, including X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, and Hall-effect measurement. The structural, chemical, and electrical evolution of the SnOx films was found to experience three stages: polycrystalline SnO phase dominated section with p-type conduction at PO ≤ 9.9%; amorphous SnO2 phase dominated area at PO ≥ 12.3%, exhibiting n-type characteristics; and conductivity dilemma area in between the above mentioned sections, featuring the coexistence of SnO and SnO2 phases with compatible and opposite contribution to the conductivity. The polycrystalline to amorphous film structure transition was ascribed to the enhanced crystallization temperature due to the perturbed structural disorder by incorporating Sn4+ into the SnO matrix. The inversion from p-type to n-type conduction with PO variation is believed to result from the competition between the donor and acceptor generation process, i.e., the n-type behavior would be present if the donor effect is overwhelming, and vice versa. In addition, with increasing PO, the refractive index decreased from 3.0 to 1.8 and the band gaps increased from 1.5 to 3.5 eV, respectively.
学科主题	材料科学
原文出处	EI收录
公开日期	2013-12-16
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/9707]
专题	宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式 GB/T 7714	梁凌燕、曹鸿涛,Hao Luo, Ling Yan Liang,* Hong Tao Cao,* Zhi Min Liu, and Fei Zhuge. Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering[J]. ACS Applied Materials &Interfaces,2012,32(4):5673—5677.
APA	梁凌燕、曹鸿涛,&Hao Luo, Ling Yan Liang,* Hong Tao Cao,* Zhi Min Liu, and Fei Zhuge.(2012).Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering.ACS Applied Materials &Interfaces,32(4),5673—5677.
MLA	梁凌燕、曹鸿涛,et al."Structural, Chemical, Optical, and Electrical Evolution of SnOx Films Deposited by Reactive rf Magnetron Sputtering".ACS Applied Materials &Interfaces 32.4(2012):5673—5677.