structural and electrical characteristics of rf sputtered yon gate     dielectrics and their thin-film transistor applications

	structural and electrical characteristics of rf sputtered yon gate dielectrics and their thin-film transistor applications
	Liu Zhimin ; Liang Lingyan ; Yu Zheng ; He Shikun ; Ye Xiaojuan ; Sun Xilian ; Sun Aihua ; Cao Hongtao
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	2011
卷号	44 期号:15 页码:-
关键词	Dielectric materials
ISSN号	0022-3727
学科主题	Physics, Applied
收录类别	其他
语种	英语
公开日期	2011-05-10
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/1396]
专题	宁波材料技术与工程研究所_宁波所知识产出
推荐引用方式 GB/T 7714	Liu Zhimin,Liang Lingyan,Yu Zheng,et al. structural and electrical characteristics of rf sputtered yon gate dielectrics and their thin-film transistor applications[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2011,44(15):-.
APA	Liu Zhimin.,Liang Lingyan.,Yu Zheng.,He Shikun.,Ye Xiaojuan.,...&Cao Hongtao.(2011).structural and electrical characteristics of rf sputtered yon gate dielectrics and their thin-film transistor applications.JOURNAL OF PHYSICS D-APPLIED PHYSICS,44(15),-.
MLA	Liu Zhimin,et al."structural and electrical characteristics of rf sputtered yon gate dielectrics and their thin-film transistor applications".JOURNAL OF PHYSICS D-APPLIED PHYSICS 44.15(2011):-.